“…Nevertheless, trade-offs are inevitable among cost, throughput, flexible feature size, and geometry, , and a cost-effective photolithographic strategy to produce submicron patterns with flexible feature geometries over a large area remains elusive . Recently, the development of polymer pen lithography, beam pen lithography (BPL), and related techniques has enabled nanopatterns over a large range of the nanoscale. ,,â However, it is challenging to apply BPL to the fabrication of TFTs or FETs because this requires an opaque metal for the coating and subsequent creation of subwavelength nanoscopic apertures at the apexes of metal-coated elastomeric pyramids, , and the repeated friction between metal-coated tips and substrates gradually wears off the metal coating …”