2001
DOI: 10.1134/1.1424410
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Liquid phase epitaxy of (GaAs)1−x (ZnSe)x solid solution layers from a lead-based solution melt

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Cited by 3 publications
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“…At the boundary region of the heterostructure, the Ga 2 Se 3 compound is formed as a by-product, whereas the Zn atoms diffuse from the interface into the GaAs substrate [6]. In Reference [7], the possibility of growing of the variable-gap solid solution (GaAs) 1−x (ZnSe) x , by liquid-phase epitaxy from a Pb solution-melt on GaAs (100) substrates with a diameter of 20 mm, in the temperature range 870-730°C, was demonstrated. Epitaxial layers (GaAs) 1−x (ZnSe) x had an n-type conductivity, a carrier concentration of n � 7.6 • 10 19 cm −3 , and a monocrystalline structure with a continuously varying composition x from 0 to 0.07.…”
Section: Introductionmentioning
confidence: 99%
“…At the boundary region of the heterostructure, the Ga 2 Se 3 compound is formed as a by-product, whereas the Zn atoms diffuse from the interface into the GaAs substrate [6]. In Reference [7], the possibility of growing of the variable-gap solid solution (GaAs) 1−x (ZnSe) x , by liquid-phase epitaxy from a Pb solution-melt on GaAs (100) substrates with a diameter of 20 mm, in the temperature range 870-730°C, was demonstrated. Epitaxial layers (GaAs) 1−x (ZnSe) x had an n-type conductivity, a carrier concentration of n � 7.6 • 10 19 cm −3 , and a monocrystalline structure with a continuously varying composition x from 0 to 0.07.…”
Section: Introductionmentioning
confidence: 99%