Lithographic performance of an ASML i-line step-and-repeat system by using photosensitive Durimides

Pellens, Rudy J. M.; Klaveren, Angelique van; Voets, Rutger; Heuvel, Jean-Paul van den; Misat, S.; Waterson, Pamela J.; Peterson, Laurie J.

doi:10.1117/12.471974

SPIE Proceedings

2003

DOI: 10.1117/12.471974

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Lithographic performance of an ASML i-line step-and-repeat system by using photosensitive Durimides

Rudy J. M. Pellens

Angelique van Klaveren

Rutger Voets

et al.

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Lithographic performance of an ASML i-line step-and-repeat system by using photosensitive Durimides

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