2014
DOI: 10.1016/j.surfcoat.2013.12.038
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Lithographically fabricated SU8 composite structures for wettability control

Abstract: SU8 is a negative resist which is widely used for the fabrication of micron scale lateral features over a wide range of heights using photolithographic methods. This has been extensively used as a method to produce surface structure to which hydrophobicity can be added and a model super-water repellent surface of achieved. However, such an approach requires at least two-steps and does not embed the desired properties as part of the structure itself or create multiple levels of topographical structure. In other… Show more

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Cited by 5 publications
(3 citation statements)
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“…It is evident that the quality of the products fabricated by the LIGA process is highly dependent on the raw materials used for patterning, as well as on their chemical behavior during processing. Hence, it is necessary to have strict control of the process parameters [4][5][6][7][8][9][10][11][12]. The photoresist layer to be patterned is fabricated by spin coating a photoresist to the desired thickness in a range from 5.0 µm to several millimeters, depending on the application.…”
Section: Deep X-ray Lithography (Dxrl)mentioning
confidence: 99%
“…It is evident that the quality of the products fabricated by the LIGA process is highly dependent on the raw materials used for patterning, as well as on their chemical behavior during processing. Hence, it is necessary to have strict control of the process parameters [4][5][6][7][8][9][10][11][12]. The photoresist layer to be patterned is fabricated by spin coating a photoresist to the desired thickness in a range from 5.0 µm to several millimeters, depending on the application.…”
Section: Deep X-ray Lithography (Dxrl)mentioning
confidence: 99%
“…The resin is indeed a speci c commercial epoxy-Novolac resin, namely SU8, with a wide range of applications as photoresist material in lithography process. SU8 is a high-temperature, chemically stable material with low toxicity and good transparency to visible light and is moderately lowcost [20][21][22][23][24][25][26][27][28]. Graphene was considered as the nanoscle single-sheet ller for the SU8 and investigated for its e ect on the nal properties of the SU8/graphene nanocomposites.…”
Section: Introductionmentioning
confidence: 99%
“…For this reason, much research into polymer composites for the application to micro devices has been carried out. [21][22][23][24][25][26][27][28][29] Polymer composites achieve high performance and functionality through the inclusion of inorganic materials in the photosensitive polymer. Chiamori et al 25) proposed the use of SU-8=gold, SU-8=diamondoids, and SU-8=carbon nano tube composites, and reported changes in mechanical properties, namely, residual stress, stiffness, viscosity, and elastic modulus.…”
Section: Introductionmentioning
confidence: 99%