High crystalline quality coaxial
GaInN/GaN multiple quantum shells
(MQSs) grown on dislocation-free nanowires are highly in demand for
efficient white-/micro-light-emitting diodes (LEDs). Here, we propose
an effective approach to improve the MQS quality during the selective
growth by metal–organic chemical vapor deposition. By increasing
the growth temperature of GaN barriers, the cathodoluminescent intensity
yielded enhancements of 0.7 and 3.9 times in the samples with GaN
and AlGaN spacers, respectively. Using an AlGaN spacer before increasing
the barrier temperature, the decomposition of GaInN quantum wells
was suppressed on all planes, resulting in a high internal quantum
efficiency up to 69%. As revealed by scanning transmission electron
microscopy (STEM) characterization, the high barrier growth temperature
allowed to achieve a clear interface between GaInN quantum wells and
GaN quantum barriers on the c-, r-, and m-planes of the nanowires. Moreover, the
correlation between the In incorporation and structure features in
MQS was quantitatively assessed based on the STEM energy-dispersive
X-ray spectroscopy mapping and line-scan profiles of In and Al fractions.
Ultimately, it was demonstrated that the unintentional In incorporation
in GaN barriers was induced by the evaporation of predeposited In-rich
particles during low-temperature growth of GaInN wells. Such residual
In contamination was sufficiently inhibited by inserting low Al fraction
(∼6%) AlGaN spacers after each GaInN well. During the growth
of AlGaN spacers, AlN polycrystalline particles were deposited on
the surrounding dummy substrate, which suppressed the evaporation
of the predeposited In-rich particles. Thus, the presence of AlGaN
spacers certainly improved the uniformity of In fraction through five
GaInN quantum wells and reduced the diffusion of point defects from n-core to MQS active structures. The superior coaxial GaInN/GaN
MQS structures with the AlGaN spacer are supposed to improve the emission
efficiency in white-/micro-LEDs.