1996
DOI: 10.1143/jjap.35.5495
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Long Electron Cyclotron Resonance Plasma Source for Reactive Sputtering

Abstract: The low-energy effective theory of the IIB matrix model developed by H. Aoki et al. is written down explicitly in terms of bosonic variables only. The effective theory is then studied by Monte Carlo simulations in order to investigate the possibility of a spontaneous breakdown of ten-dimensional Lorentz invariance. The imaginary part of the effective action, which causes the so-called sign problem in the simulation, is dropped by hand. The extent of the eigenvalue distribution of the bosonic matrices shows a p… Show more

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Cited by 5 publications
(2 citation statements)
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“…Figure 16 shows radially resolved ion densities in the Kaufman source determined by Langmuir probe measurements. Near the discharge anode a radial electron confinement is achieved by the permanent magnets which causes higher electron and ion densities towards the source walls [37,38]. The magnetic field is only sufficient for confining electrons, but ions are indirectly confined by the electrical fields produced by the spatially changed electron mobility.…”
Section: 32mentioning
confidence: 99%
“…Figure 16 shows radially resolved ion densities in the Kaufman source determined by Langmuir probe measurements. Near the discharge anode a radial electron confinement is achieved by the permanent magnets which causes higher electron and ion densities towards the source walls [37,38]. The magnetic field is only sufficient for confining electrons, but ions are indirectly confined by the electrical fields produced by the spatially changed electron mobility.…”
Section: 32mentioning
confidence: 99%
“…A rectangular-shape microwave source capable of producing uniform plasma has been being developed for charge neutralization and ion beams extraction. A long rectangular plasma source has been already developed [1], but this type of plasma source utilizes a complicated geometry to achieve coupling of microwave power into the produced plasma. A plasma source with the simple structure shown in Figure 1 has been proposed to extend maintenance interval for use in semi-conductor production environment.…”
mentioning
confidence: 99%