“…Fabrication of structurally continuous gold films below 15 -20 nm is, in general, difficult to achieve on commonly used optical surfaces, including amorphous and crystalline materials such as glass [ 13 ], native silicon oxide [ 14 ], Si 3 N 4 [ 15 ], TiO 2 [ 16 ], and certain transparent polymers [ 17 ]. For a range of crystalline substrates, including sapphire, mica, silicon, NaCl , KCl, and LiF [ 9 , 11 , 18 , 19 ], epitaxial single-crystal gold islands or sheets can be formed.…”