Low-cost single-mode waveguide fabrication allowing passive fiber coupling using LIGA and UV flood exposure

Henzi, Patric; Rabus, Dominik G.; Bade, K.; Wallrabe, Ulrike; Mohr, J.

doi:10.1117/12.544477

Cited by 18 publications

(4 citation statements)

References 20 publications

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“…Since the minimum resolution achievable with a lithographic tool is limited by the diffraction and is a function of the exposure wavelength and the numerical aperture of the lens system, higher resolution can be obtained by using deep ultraviolet (DUV) lithography [7,8]. Moreover, some polymers exposed to DUV light undergo variation of their refractive indices, as has already been demonstrated for photo-resists such as polyvinylcinnamate (PVCi) [9,10] and polymethylmethacrylate (PMMA) [11,12].…”

Section: Introductionmentioning

confidence: 99%

Fabrication and optical characterization of sub-micronic waveguide structures on UV210 polymer

Duval¹,

Lhermite²,

Godet³

et al. 2010

J. Opt.

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In this paper, we report on the interest in a new polymer, UV210, in the field of integrated optics. As 400 nm wide and 1 µm high UV210 rib waveguides have been obtained by deep ultraviolet (DUV) lithography and controlled by scanning electron micrographs (SEMs), they allow us to realize sub-wavelength structures by way of easy and cheap processes. Structural and optical investigations have been carried out on UV210 resist as a function of exposure to DUV light. On the one hand, structural properties through ellipsometric measurements have been investigated: the UV210 refractive index increases with the DUV exposure dose, yielding a large index contrast at 980 nm between areas exposed or not (Δn = 2 × 10 − 2). It is expected that we shall soon be able to photo-print nanometric patterns onto UV210 films. On the other hand, optical studies of propagation losses measured in both irradiated and unexposed single-mode UV210 waveguides have been performed by a cut-back method. Concerning as-deposited rib waveguides, optical losses for TE00 and TM00 optical modes have been evaluated to 3.4 ± 0.4 dB cm − 1 and 6.2 ± 0.5 dB cm − 1, respectively. Hence, the UV210 polymer appears to be a promising candidate for the development of low-cost nanometric structures for miniaturized optical chips, with numerous applications in telecommunication and sensor technology.

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Section: Introductionmentioning

confidence: 99%

Fabrication and optical characterization of sub-micronic waveguide structures on UV210 polymer

Duval¹,

Lhermite²,

Godet³

et al. 2010

J. Opt.

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“…Henzi et al have reported that the absorption peak of PMMA at 190 -290 nm increases with increasing exposure dose under vacuum condition. 8,9) Similar to that of PMMA, the intensity of absorption of the shoulder peak of OZ-1000 increases with increasing exposure dose. The increasing absorption peak below 200 nm represents the generation and reaction of unsaturated bonds.…”

Section: Uv Spectroscopymentioning

confidence: 82%

Material Investigation of Alicyclic Methacrylate Copolymer for Polymer Waveguide Fabrication

Ichihashi¹,

Bruendel²,

Rabus³

et al. 2006

jjap

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We investigated the physical and chemical properties of alicyclic methacrylate copolymers and their changes under deep-UV exposure. It was shown that alicyclic methacrylate copolymers have a better thermal stability and a higher refractive index than conventional poly(methyl methacrylate) (PMMA). Fourier transform IR (FTIR) spectra show the scission of the carbonyl group of the alicyclic methacrylate copolymers by deep-UV exposure similar to that of PMMA. This structural modification results in a local and controllable increase in refractive index in the exposed areas of the polymer surface. We fabricated polymer waveguides from alicyclic methacrylate copolymers by conventional photolithography using quartz/chromium mask. The minimum propagation loss of the straight waveguide with a 7.5 mm width was 2 dB/cm at 1550 nm.

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“…Compared to the most common optical polymer poly(methyl methacrylate) (PMMA), the alicyclic methacrylate copolymers have higher refractive index, higher thermal stability and lower water absorption. [7][8][9][10][11][12] By deep-UV exposure the refractive index of the polymer could be altered. [13][14][15][16][17] By using lithographic techniques using standard photomasks (Cr on glass) a local and controllable increase of the refractive index in the exposed areas of the polymer surface could be achieved, generating the integrated-optical waveguiding structures.…”

Section: Introductionmentioning

confidence: 99%

Novel polymer waveguides consisting of an alicyclic methacrylate copolymer

et al. 2006

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We investigate the deep-UV-induced refractive index modification of alicyclic methacrylate copolymers for realizing integrated optical circuits for the development of cheap, disposable integrated optical sensors for chemical and biological monitoring. These novel copolymers obtain higher glass transition temperature (Tg), refractive index and lower water absorption than conventional poly(methylmethacrylate) (PMMA). At the same time, the adhesion of living mammalian cells on the UV exposed polymer surface was investigated for the application for biosensor.

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Low-cost single-mode waveguide fabrication allowing passive fiber coupling using LIGA and UV flood exposure

Cited by 18 publications

References 20 publications

Fabrication and optical characterization of sub-micronic waveguide structures on UV210 polymer

Fabrication and optical characterization of sub-micronic waveguide structures on UV210 polymer

Material Investigation of Alicyclic Methacrylate Copolymer for Polymer Waveguide Fabrication

Novel polymer waveguides consisting of an alicyclic methacrylate copolymer

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