2022
DOI: 10.1016/j.apsusc.2021.152023
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Low-density arrays of ultra-small InAs nanostructures obtained by two-stage arsenic exposure during droplet epitaxy

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Cited by 5 publications
(1 citation statement)
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“…At the same time, this shortcoming is eliminated in the droplet epitaxy technology [14], where the formation of A 3 B 5 quantum dots is multi-stage with a number of phases: deposition of droplets of group III atoms, correction of shape and crystallization in a flow of group V molecules, as well as annealing of the obtained nanostructures. A selection of process parameters at each growth stage ensures control of nanostructures' shape, size and surface density in a wide range [7,15,16]. However, even in case of the said approach there is the still unsolved and topical problem of creation of quantum dot arrays in an InAs/GaAs system, which have ultra-low density (< 10 8 cm −2 ) and small structure sizes (< 30 nm) at the same time (such parameters are necessary for the making of nanoelectronics and nanophotonics devices on their basis) [17].…”
Section: Introductionmentioning
confidence: 99%
“…At the same time, this shortcoming is eliminated in the droplet epitaxy technology [14], where the formation of A 3 B 5 quantum dots is multi-stage with a number of phases: deposition of droplets of group III atoms, correction of shape and crystallization in a flow of group V molecules, as well as annealing of the obtained nanostructures. A selection of process parameters at each growth stage ensures control of nanostructures' shape, size and surface density in a wide range [7,15,16]. However, even in case of the said approach there is the still unsolved and topical problem of creation of quantum dot arrays in an InAs/GaAs system, which have ultra-low density (< 10 8 cm −2 ) and small structure sizes (< 30 nm) at the same time (such parameters are necessary for the making of nanoelectronics and nanophotonics devices on their basis) [17].…”
Section: Introductionmentioning
confidence: 99%