Low frequency d.c. pulsed plasma for iron nitriding

Bougdira, J.; Henrion, G.; Fabry, M.; Remy, M.; Cussenot, J.R.

doi:10.1016/0921-5093(91)90587-d

Cited by 27 publications

(7 citation statements)

References 5 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Our earlier work (Bougdira et al 1991a, b, Hugon et al 1993 led to promising metallurgical results for iron nitriding, which have been confirmed in the case of austenitic stainless steel nitriding (Michel 1993). Here, we study the time evolution of the intensity of characteristic emission lines of N 2 and N + 2 as well as those of iron atoms sputtered from the cathode and excited in the plasma over one voltage period under typical nitriding conditions.…”

Section: Introductionmentioning

confidence: 65%

The influence of the respective durations of the discharge and the afterglow on the reactivity of a DC pulsed plasma used for iron nitriding

Hugon¹,

Fabry²,

Henrion³

1996

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

The optical diagnostics of a DC pulsed plasma used for iron nitriding is carried out for various plasma conditions. The fluorescence of the first negative and the second positive systems of is observed in the time afterglow, in order to obtain some insights into the creation and the loss processes of and states. An iron emission line is also observed which is indicative of the sample sputtering. Particular attention is paid to the influence of the gas pressure on the respective durations of the discharge and the afterglow. Analysis of the plasma both during the discharge and during the post-discharge leads to the determination of favourable conditions for the surface treatment. It is also shown that the electron density in the discharge can be deduced from the line intensity decay in the afterglow.

show abstract

Section: Introductionmentioning

confidence: 65%

The influence of the respective durations of the discharge and the afterglow on the reactivity of a DC pulsed plasma used for iron nitriding

Hugon¹,

Fabry²,

Henrion³

1996

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

show abstract

“…Pulsed plasmas are important in a number of material's processing applications such as in reactive ion etching [1], reactive magnetron sputtering [2], pulsed glow discharge plasma nitriding [3] and in plasma polymerization [4]. Modulating the discharge waveform has advantages in terms of enhanced consumed electrical power efficiency and greater control over the plasma properties, particularly the ion energy distribution function (IEDF) at a work piece or substrate [5].…”

Section: Introductionmentioning

confidence: 99%

A technique for obtaining time- and energy-resolved mass spectroscopic measurements on pulsed plasmas

Karkari¹,

Bäcker²,

Forder³

et al. 2002

Meas. Sci. Technol.

View full text Add to dashboard Cite

We present a simple technique for obtaining the time-resolved ion energy distribution function (IEDF) at a boundary in pulsed plasmas using a commercial quadrupole mass energy analyser. In this technique, ions are extracted from the plasma at selected parts of the pulse cycle, through the synchronized electrical biasing of a grid assembly attached to the barrel of the instrument, forming an electrostatic shutter. This sampling method has the advantage over the normal technique of electronically gating the detected ion signal to achieve time resolution, since the IEDFs can be obtained even when the ion flight time through the instrument (typically 100 µs) is greater than the pulse period or the characteristic time of transients in the plasma under investigation. The arrangement allows us therefore to diagnose plasmas pulsed at high frequencies (≥10 kHz). Presently, a time resolution of 4 µs can be obtained, limited only by the driving electronics design. The technique has been tested on a DC magnetron discharge operated in argon. The plasma was pulsed at a low frequency of 2 kHz, but with a discharge voltage waveform containing fast transients (on the µs time scale or faster). The results show clearly the evolution of the IEDFs during the pulse, responding to these fast transients with a significant number of ions created at plasma potentials above 140 V. These time-evolved IEDFs cannot be obtained using the conventional, manufacturer’s time-resolved method for this instrument. However, the new technique does introduce a small distortion in the measured IEDFs at energies above 120 eV, which is always observed, irrespective of the position of the shutter window during the pulse. This is due to the transient nature of the discriminating grid bias used in the electrostatic shuttering. Its effects and possible elimination are discussed.

show abstract

“…The electric discharge across the gas inside the reactor was generated by a pulsed dc power supply [6]. The voltage is a polarized square wave with an amplitude that may be varied from 0 to 600 V. This negative potential is applied to the metallic sample holder, the rest of the chamber remaining at ground potential.…”

Section: Nitriding Conditionsmentioning

confidence: 99%

In situsynchrotron radiation diffraction study of low carbon steel during ion nitriding

Feugeas

Hermida

Kellermann

et al. 1999

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

The volume close to the surface of materials subjected to ion implantation or ion diffusion exhibits structural transformations that are usually studied by x-ray diffraction. In order to characterize the kinetic aspects of structural transformations in low carbon AISI 1010 steel during ion nitriding, an in situ synchrotron radiation diffraction study was performed. An experimental set-up, a specially designed reactor, was constructed for x-ray measurements in real time. The variation in the lattice parameter with time of the initial Fe- phase was attributed to the heating effect produced by the action of an electric discharge during the first stages of the process. The analysis of the x-ray diffraction patterns indicates the formation of several iron nitrides. The Fe3N phase exhibits a progressive decrease in the interplanar distances, which is clearly a different behaviour with respect to the other observed phases, even considering a phase with nearly the same stoichiometry.

show abstract

Low frequency d.c. pulsed plasma for iron nitriding

Cited by 27 publications

References 5 publications

The influence of the respective durations of the discharge and the afterglow on the reactivity of a DC pulsed plasma used for iron nitriding

The influence of the respective durations of the discharge and the afterglow on the reactivity of a DC pulsed plasma used for iron nitriding

A technique for obtaining time- and energy-resolved mass spectroscopic measurements on pulsed plasmas

In situsynchrotron radiation diffraction study of low carbon steel during ion nitriding

Contact Info

Product

Resources

About