2015
DOI: 10.1021/acs.nanolett.5b03449
|View full text |Cite
|
Sign up to set email alerts
|

Low Leakage-Current InAsSb Nanowire Photodetectors on Silicon

Abstract: Axially doped p-i-n InAs0.93Sb0.07 nanowire arrays have been grown on Si substrates and fabricated into photodetectors for shortwave infrared detection. The devices exhibit a leakage current density around 2 mA/cm(2) and a 20% cutoff of 2.3 μm at 300 K. This record low leakage current density for InAsSb based devices demonstrates the suitability of nanowires for the integration of III-V semiconductors with silicon technology.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

4
103
1

Year Published

2016
2016
2023
2023

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 71 publications
(113 citation statements)
references
References 27 publications
(44 reference statements)
4
103
1
Order By: Relevance
“…In particular, self-catalyzed vapor-liquid-solid (VLS) NW growth [2,3] enables direct epitaxial integration of high quality III-V semiconductor materials on Si substrates without the use of foreign metal catalysts such as Au, which may form unwanted defect states [4]. Exploitation of NWs in LEDs [5,6], solar cells [7,8], photodetectors [9], and other optoelectronic devices requires a controllable methodology for doping. Consequently, significant efforts have been put into the investigation of the NW doping process [10].…”
Section: Introductionmentioning
confidence: 99%
“…In particular, self-catalyzed vapor-liquid-solid (VLS) NW growth [2,3] enables direct epitaxial integration of high quality III-V semiconductor materials on Si substrates without the use of foreign metal catalysts such as Au, which may form unwanted defect states [4]. Exploitation of NWs in LEDs [5,6], solar cells [7,8], photodetectors [9], and other optoelectronic devices requires a controllable methodology for doping. Consequently, significant efforts have been put into the investigation of the NW doping process [10].…”
Section: Introductionmentioning
confidence: 99%
“…Instead using contact barriers, directly integrating rectifying junctions in nanowires offer an ideal solution to improve the on‐off ratio in III–V nanowire based photodetectors. From such perspective, researchers have been attempting to fabricate dopant‐gradient nanowires . Figure a displays the structure of a photodetector based on InAs 1‐x Sb x nanowire array (Figure b), with the nanowires built directly with axial p‐i‐n junctions.…”
Section: Nanostructured Infrared Sensitive Materials For Photodetectorsmentioning
confidence: 99%
“…e) The photoresponse spectra of InAsSb photodetector at 300K. Reproduced with permission . Copyright 2016, American Chemical Society.…”
Section: Nanostructured Infrared Sensitive Materials For Photodetectorsmentioning
confidence: 99%
See 1 more Smart Citation
“…However, InAs surface is well known to suffer from a very high level of electron states resulting which is the source of high surface leakage currents facing in InAs bulk photodiodes. 3,4 InAs NWs are more susceptible to detrimental surface states 5 A cm −2 at −0.1 V at room temperature, which is promising for integration of low noise III-V photodiodes with other nanophotonic building blocks on Si-based circuits.…”
Section: Introductionmentioning
confidence: 99%