Low-loss modified SU-8 waveguides by direct laser writing at 405 nm

Ramirez, Jhonattan C.; Schianti, Juliana N.; Almeida, M. Gabriela; Pavani, Aristides; Panepucci, Roberto R.; Hernandez-Figueroa, Hugo E.; Gabrielli, Lucas H.

doi:10.1364/ome.7.002651

Cited by 34 publications

(20 citation statements)

References 34 publications

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“…Afterward, the sample was fully washed with deionized water and dried with N 2 flow. The selected photo-resist SU-8 2100 was diluted from 75% solid down to 3% solid with cyclopentanone and,then adjusted to weight concentrations of 0.1% H-nu 470 photoinitiator, 0.1% AN-910E cationic cure accelerator, and 2.5% OPPI photoacid generator (4-(octyloxy) phenylphenyliodium hexafluoroantimonate) [9]. The sample was spin coated with the modified phot-resist for 10 seconds at 500 rpm, followed by 30 seconds at 8000 rpm.…”

Section: Resultsmentioning

confidence: 99%

“…Recently, we demonstrated a new fabrication platform for optical devices based on polymer technology in the visible spectrum through Direct Laser Writer (DLW) system, which presents a highly reliable, rapid prototyping and very low cost fabrication method [9]. To photosensitize SU-8 in the visible spectrum, the commercial photoinitiator H-nu 470 was required, which allows to change the maximum pre-polymerized absorption peak of the polymer from 365 nm to 470 nm wavelength.…”

Section: Introductionmentioning

confidence: 99%

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Dielectric barrier discharge plasma treatment of modified SU-8 for biosensing applications

Ramirez¹,

Schianti²,

Souto³

et al. 2018

Biomed. Opt. Express

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Dielectric barrier discharge plasma treatment of modified SU-8 for biosensing applications

Ramirez¹,

Schianti²,

Souto³

et al. 2018

Biomed. Opt. Express

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“…It can be concluded from Table 1 that for the first cycle up to the 8th cycle, the number of electrons transferred was 1. In common practice, the DNA biosensor will be used only once for bare Au measurement and thus it can be concluded that the proposed FR4-based substrate fulfilled (1). Further analysis on the same sensor until 21st cycles was shown in Figure 6.…”

Section: Peak Potential Separationmentioning

confidence: 89%

“…SU8 film fabrication on silicon or glass are biocompatible substrates that has been widely reported [1] but the large gap of thermal expansion coefficients (TEC) between silicon/glass and SU8 in which TEC of silicon is 3.2 ppm/C [2], glass plate is 8.6 ppm/C [3] and SU8 is 52 ppm/C [4] caused microcracks on SU8 fabricated on silicon/glass [5]. The characteristic of silicon or glass which is hard and brittle made it difficult for drilling and dicing thus required complex equipments such as deep reactive ion etching (DRIE) and diamond-coated cutter for dicing.…”

Section: Introductionmentioning

confidence: 99%

Cyclic voltammetry characterization analysis on the cu/flame retardant 4 fabricated biosensor

Hamzah

Malik

Zulhanip

et al. 2020

IJEECS

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Silicon, glass and ceramic are commonly base substrate used in DNA biosensor fabrication due to its biocompatible, expensive, hard and brittle. However due to the difficulty for drilling and dicing, these materials required expensive equipments and complex methodology of fabrication. Large gap of thermal expansion coefficient (TEC) between silicon/glass and film caused microcracks. Hence, the aim of this work is to investigate the suitability and the application of a non-biocompatible material, flame retardant 4 (FR4) as a base substrate for a label free DNA biosensor. Cyclic voltammetry (CV) reversible method has been implemented to test the fabricated Cu/Au on the FR4. It is found that the fabrication of Au has been made possible by the used of oxide-free Cu as an adhesion layer on the FR4 substrate. The area size of counter electrode (CE), working electrode (WE) and reference electrode (RE) are found to be 6.25 mm2, 0.581 mm2 and 1.04 mm2, respectively, in order to achieve the unity reversible redox relationship and to ensure the sensor’s reliability for 10 mM K3Fe(CN)6 solution in 0.1 M KCl. Thus it can be concluded that the proposed FR4-based substrate fulfilled the CV reversible process characterization.

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“…It has been used extensively for microfabrication and applications include drug delivery, wave guides, micro‐nozzles for microfluidic devices, and diffractive barcodes . New strategies for pushing this compound toward new applications have included electron beam lithography, two or multiphoton absorption, and direct laser writing . The photoactive compound in SU‐8 is the triarylsulfonium hexafluoroantimonate, and its photodissociation process is depicted in Figure …”

Section: Introductionmentioning

confidence: 99%

Mass‐Spectrometric Observation of Counter Anion Production in SU‐8 Exposed to UV Light and its Use for Dill C Parameter Determination

Lima

Martins

Pinheiro

et al. 2019

J Polym Sci B Polym Phys

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Photopolymerization is a phenomenon that is the basis of much of today´s microfabrication technology and intense research is conducted to improve its control and the characteristics of end products for a variety of applications. The design of microscopic structures often relies on the accurate knowledge and modeling of photopolymer´s behavior upon exposure, i.e. the Dill parameters, for each radiation species of interest and therefore the development of flexible characterization techniques is of great importance. SU-8 is a popular compound that is representative of a whole class that relies on cationic polymerization, where an acid is obtained via photolysis of an onium salt during exposure. Here we report on the observation of SbF 6 − via laser desorption mass spectrometry on SU-8 exposed to UV light at the wavelength of 365 nm and demonstrate that the yield of this counter-anion as a function of exposure is consistent with the Dill C parameter value available in the literature.

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Low-loss modified SU-8 waveguides by direct laser writing at 405 nm

Cited by 34 publications

References 34 publications

Dielectric barrier discharge plasma treatment of modified SU-8 for biosensing applications

Dielectric barrier discharge plasma treatment of modified SU-8 for biosensing applications

Cyclic voltammetry characterization analysis on the cu/flame retardant 4 fabricated biosensor

Mass‐Spectrometric Observation of Counter Anion Production in SU‐8 Exposed to UV Light and its Use for Dill C Parameter Determination

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