2016
DOI: 10.1063/1.4953258
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Low-noise epitaxial graphene on SiC Hall effect element for commercial applications

Abstract: In this report, we demonstrate a complete Hall effect element that is based on quasi-free-standing monolayer graphene synthesized on a semi-insulating on-axis Si-terminated 6H-SiC substrate in an epitaxial Chemical Vapor Deposition process. The device offers the current-mode sensitivity of 87 V/AT and low excess noise (Hooge's parameter αH < 2 × 10−3) enabling room-temperature magnetic resolution of 650 nT/Hz0.5 at 10 Hz, 95 nT/Hz0.5 at 1 kHz, and 14 nT/Hz0.5 at 100 kHz at the total active area of 0.127… Show more

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Cited by 25 publications
(9 citation statements)
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“…The main result of this transformation is the change of the intrinsic doping from electron to hole type (due to the spontaneous polarization (SP) of the SiC substrate) and the significant enhancement of carrier mobilities (due to effective decoupling of graphene from the substrate) 10,15,16 . While QFSG had already resulted in improved intrinsic cut-off frequency graphene field-effect transistors (GFET) 6 and low-noise Hall effect sensors 17 , there are currently no studies investigating the changes in its electronic properties due to atmospheric influence, in particular changes in humidity. Since water is the most abundant dipole adsorbate in the ambient air, it is important to investigate its effects on QFSG.…”
Section: Introductionmentioning
confidence: 99%
“…The main result of this transformation is the change of the intrinsic doping from electron to hole type (due to the spontaneous polarization (SP) of the SiC substrate) and the significant enhancement of carrier mobilities (due to effective decoupling of graphene from the substrate) 10,15,16 . While QFSG had already resulted in improved intrinsic cut-off frequency graphene field-effect transistors (GFET) 6 and low-noise Hall effect sensors 17 , there are currently no studies investigating the changes in its electronic properties due to atmospheric influence, in particular changes in humidity. Since water is the most abundant dipole adsorbate in the ambient air, it is important to investigate its effects on QFSG.…”
Section: Introductionmentioning
confidence: 99%
“…The significant doping of graphene in the all-CVD heterostructure devices is another major reason behind the reduced Hall sensitivities and it could be due to contaminations introduced during wet-transfer process of large area graphene and h-BN layers. This could explain also the significantly lower minimum magnetic field resolution of Hall sensors based on all-CVD h-BN/graphene/h-BN heterostructures compared to previous reports on graphene Hall sensors 17,[19][20][21][22] . These are currently the practical challenges for the development of graphene and 2D materials science and technology.…”
Section: Discussionmentioning
confidence: 71%
“…Thus, current-related sensitivities SI~5700 V/AT were obtained on stacks of all-exfoliated h-BN/graphene/h-BN 17 , SI~2270 V/AT on single crystal CVD graphene patches encapsulated between exfoliated h-BN 18 , and SI~1986 V/AT with batch-fabricated CVD graphene on in-situ grown CVD h-BN substrate without top encapsulation 19 . In addition to increased sensitivities, high linearity 12,20 and low noise of the devices [20][21][22] combined with transparency and flexibility 18,23 generates a high interest in graphene for the use in magnetic Hall sensors. However, for practical utilization in ambient environment over longer period, there is a necessity to investigate graphene Hall sensors fabricated by a scalable process using all-CVD grown 2D material heterostructures with full encapsulation of graphene active region.…”
Section: Introductionmentioning
confidence: 99%
“…QFS graphene [ 26 , 27 , 28 , 29 ] necessary for the graphene-based HTHS was grown on semi-insulating high-purity on-axis 4H-SiC(0001) (Cree Inc.) in a hot-wall Aixtron VP508 reactor using the epitaxial Chemical Vapor Deposition method [ 30 ], with thermally decomposed propane as a carbon source and in situ hydrogen atom intercalation [ 31 ]. The substrate was processed into a 1.6 mm × 1.6 mm Hall effect structure featuring a cross-shaped [ 32 ] 100 m × 300 m graphene mesa and four Ti/Au (10 nm / 60 nm) ohmic contacts, all passivated with a 100 nm-thick aluminum oxide (Al 2 O 3 ) layer synthesized from trimethylaluminum (TMA) and deionized water at 670 K in a Picosun R200 Advanced Atomic Layer Deposition (ALD) reactor [ 33 , 34 ]. Detailed information on the fabrication processes is included in Refs.…”
Section: Methodsmentioning
confidence: 99%