2006
DOI: 10.1063/1.2159546
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Low-noise La0.7Sr0.3MnO3 thermometers for uncooled bolometric applications

Abstract: We report measurements of the temperature coefficient of the resistance (TCR) and the low-frequency noise of epitaxial La0.7Sr0.3MnO3 (LSMO) thin films deposited on SrTiO3 (STO) and (LaAlO3)0.3(Sr2AlTaO6)0.7 substrates. An x-ray-diffraction study showed that the films were (001) oriented. A normalized Hooge parameter of 9×10−31m3 was measured at 300K in the case of a 10-μm-wide, 575-μm-long line patterned in the 200-nm-thick film grown on STO substrate. This value is among the lowest reported values for mangan… Show more

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Cited by 54 publications
(31 citation statements)
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“…5b) respectively. These values are slightly higher than those reported in manganite thin films being considered for bolometric applications, in which the TCR coefficient in the 1-3 % K -1 range [9].…”
Section: Resultscontrasting
confidence: 43%
“…5b) respectively. These values are slightly higher than those reported in manganite thin films being considered for bolometric applications, in which the TCR coefficient in the 1-3 % K -1 range [9].…”
Section: Resultscontrasting
confidence: 43%
“…We studied La 0.7 Sr 0.3 MnO 3 films with thicknesses d =50, 100, 150, and 200 nm. The films were grown by the pulsed laser deposition technique on the ∼ 5 × 5 × 1 mm 3 (001) SrTiO 3 substrates in two different laboratories [39,40] and have T C of 330 K. The FMR measurements in the parallel field showed biaxial (four-fold) in-plane anisotropy of all these epitaxial films. We measured magnetically-modulated microwave absorption and dispersion in 1 × 1 mm 2 pieces of these films when the magnetic field was swept from large negative to large positive values (typically, from -10 kOe to 10 kOe).…”
Section: Experiments and Comparison To Model A Experimental Procmentioning
confidence: 99%
“…Under a gas mixture condition of N 2 :Ar = 4:1, the TCRs of the Nb 5 N 6 thin films are 0.65% K 1 for SiO 2 /Si(100) substrate and 0.91% K 1 for SiO 2 substrate at room temperature, they are much higher than those grown on Si (100) substrates. Those TCRs also outclass platinum (0.25% K 1 ) [3] , Nb ( 0.1% K 1 ) [2] , single-walled carbon nanotubes (SWCNTs, 0.17% K 1 ) [7] , permalloy on Si(100) (0.25% K 1 ) [8] and can be comparable to La 0.7 Sr 0.3 MnO 3 (LSMO) (1.7% K 1 ) [9] . In conclusion, by optimizing the deposition parameters, we have successfully fabricated Nb 5 N 6 thin film with larger TCR on Si(100), SiO 2 /Si(100), crystal SiO 2 substrates by using r f magnetron sputtering.…”
Section: Materials Science and Engineeringmentioning
confidence: 96%