Voltage responsivity of bolometer will benefit from high temperature coefficient of resistance (TCR) of the material. The Nb 5 N 6 thin solid films we proposed in this paper have high TCR, compared with the commonly-used materials such as Nb and Bi. The films were sputtered on Si(100), SiO 2 /Si(100), SiO 2 substrates by using radio frequency (r f ) magnetron sputtering. The deposition conditions have been optimized to get high TCR. The highest TCR is over 0.91% K 1 at 300 K and up to 4.5% K 1 -7% K 1 at 78 K, which is good enough to be used in terahertz detection and thermometer fabrication in the range from 78 K to 300 K.Nb 5 N 6 thin solid films, temperature coefficient of resistance (TCR), terahertz detection, thermometer There is great demand for high-performance terahertz (THz) detectors in remote sensing, spectroscopy, plasma diagnostics and communications. Bismuth [1] and niobium [2] are commonly-used candidate materials for fabricating such devices. However, the lower temperature coefficient of resistance (TCR) of Bi (~ 0.3% K 1 ) and Nb (~ 0.1% K 1 ) do not allow us to achieve high voltage responsivity. Recently, Bourgeois et al. [3] reported a highly nitrogen-doped niobium thin film on sapphire substrate with a TCR of about 0.7% K 1 -0.9% K 1 at room temperature and 5.3% K 1 at 77 K. However, sapphire is not a suitable substrate in THz region due to its relatively large loss compared with high-resistive silicon (Si) and silicon oxide (SiO 2 ). In this paper we presented our results on the fabrication of nitrogen-rich niobium nitride thin solid films on Si(100), SiO 2 /Si(100) (SiO 2 layer: 100-nm-thick, grown by thermal oxidation) and crystal SiO 2 substrates. The X-ray diffraction (XRD) analyses suggest that such films belong to Nb 5 N 6 on structure [4] . The obtained TCR values range from 0.51% K 1 -0.91% K 1 at room temperature and up to 4.5% K 1 -7% K 1 at 78 K, implying that high TCR value is still kept. This work demonstrated Nb 5 N 6 thin film on Si(100), SiO 2 /Si(100) and SiO 2 substrate is a good material for THz bolometer and thermometer in the range from 78 to 300 K.All the thin solid films are fabricated in situ by using radio frequency (r f ) magnetron sputtering technique. The substrates are firstly exposed to ion beams to remove the contamination on the surface. Coming from a Kaufman source, the ion is accelerated to the energy of 300 eV, and the ion current is adjusted to 30 -40 mA. With a niobium target, 100 mm in diameter and a purity of 99.999%, the deposition takes place in a gas mixture of argon (Ar, a purity of 99.999%) and nitrogen (N 2 , a purity of 99.999%). As the TCRs of the thin solid films are greatly influenced by their nitrogen content, that is to say, depend on the proportion of N 2 in the gas mixture, therefore N 2 and Ar are dominated by mass flux controllers. The proportion of the two gases (N 2 : Ar) varied from 10: 10 to 40: 10. After deposition, the films are put in nitrogen at room temperature over 1 hour, which may help to stabilize the film proper...