Low‐Pressure PECVD of Nanoparticles in Carbon Thin Films from Ar/H2/C2H2 Plasmas: Synthesis of Films and Analysis of the Electron Energy Distribution Function

Camero, M; Gordillo‐Vázquez, F. J.; Gómez‐Aleixandre, C.

doi:10.1002/cvde.200606554

Cited by 7 publications

(3 citation statements)

References 50 publications

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“…The minimum reflection occurs with a 35%v/v loading of TEOS binder which produces a hardness of 4.4 GPa. This value is comparable to various other nanoparticle protective coatings. − A more common and simple approach used for mechanical testing is a pencil hardness test. A hardness value of 4.4 GPa will pass a 5H pencil test, which is above the industry standard of 3H required for practical applications .…”

Section: Resultssupporting

confidence: 52%

High-Performance, Single-Layer Antireflective Optical Coatings Comprising Mesoporous Silica Nanoparticles

Moghal

Kobler²,

Sauer³

et al. 2012

ACS Appl. Mater. Interfaces

148

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Mesoporous silica nanoparticles are used to fabricate antireflectance coatings on glass substrates. The combination of mesoporous silica nanoparticles in conjunction with a suitable binder material allows mechanically robust single layer coatings with a reflectance <0.1% to be produced by simple wet processing techniques. Further advantages of these films is that their structure results in broadband antireflective properties with a reflection minimum that can tuned between 400 nm and 1900 nm. The ratio of binder material to mesoporous nanoparticles allows control of the refractive index. In this report, we discuss how control of the structural properties of the coatings allows optimization of the optical properties.

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Section: Resultssupporting

confidence: 52%

High-Performance, Single-Layer Antireflective Optical Coatings Comprising Mesoporous Silica Nanoparticles

Moghal

Kobler²,

Sauer³

et al. 2012

ACS Appl. Mater. Interfaces

148

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“…Here, the inert gas Ar is the carrier gas and is used as a dilutant when r CH or r H is varied. Such gas mixtures are commonly used in carbon nanostructure synthesis experiments [42][43][44]. The ion and electron temperature are assumed constant throughout the sheath.…”

Section: Numerical Model and Basic Equationsmentioning

confidence: 99%

Low- and high-temperature controls in carbon nanofiber growth in reactive plasmas

2010

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A numerical growth model is used to describe the catalyzed growth of carbon nanofibers in the sheath of a low-temperature plasma. Using the model, the effects of variation in the plasma sheath parameters and substrate potential on the carbon nanofiber growth characteristics, such as the growth rate, the effective carbon flux to the catalyst surface, and surface coverages, have been investigated. It is shown that variations in the parameters, which change the sheath width, mainly affect the growth parameters at the low catalyst temperatures, whereas the other parameters such as the gas pressure, ion temperature, and percentages of the hydrocarbon and etching gases, strongly affect the carbon nanofiber growth at higher temperatures. The conditions under which the carbon nanofiber growth can still proceed under low nanodevice-friendly process temperatures have been formulated and summarized. These results are consistent with the available experimental results and can also be used for catalyzed growth of other high-aspect-ratio nanostructures in low-temperature plasmas.

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“…Various particles move towards the substrate and are deposited on it to form amorphous thin films. The resulting thin film is then incorporated into industrial devices; in particular, electronic devices, solar cells and thin film transistors for controlling liquid crystal display (LCD) panels [3,4].…”

Section: Introductionmentioning

confidence: 99%

Space–Time Coupled Finite Element Simulation of PECVD Reactor

Dehghanifard

Ahmadi

Ganjovi

et al. 2015

Int. J. Appl. Comput. Math

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In this paper, space-time distribution of nanoparticles, as predicted by the fluid model, is simulated using Galerkin based space-time coupled finite element methodology. The method is utilized to simulate the silane discharge process and the ensuing behavior of the affected particles as a function of time in a plasma enhanced chemical vapor deposition (PECVD) reactor. PECVD is a practical technique of producing thin silicon films. Simulation of this process, as modeled by a set of nonlinear partial differential equations, requires extensive resolution in time. An attempt at establishing a stable and convergent computational process was successful only when space-time coupled finite element methodology was utilized to simulate this problem. Details of the methodology along with results of a particular test case are presented.

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Low‐Pressure PECVD of Nanoparticles in Carbon Thin Films from Ar/H₂/C₂H₂ Plasmas: Synthesis of Films and Analysis of the Electron Energy Distribution Function

Cited by 7 publications

References 50 publications

High-Performance, Single-Layer Antireflective Optical Coatings Comprising Mesoporous Silica Nanoparticles

High-Performance, Single-Layer Antireflective Optical Coatings Comprising Mesoporous Silica Nanoparticles

Low- and high-temperature controls in carbon nanofiber growth in reactive plasmas

Space–Time Coupled Finite Element Simulation of PECVD Reactor

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