2003
DOI: 10.1016/s0022-0248(03)01346-0
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Low-resistance p-type polycrystalline GaSb grown by molecular beam epitaxy

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Cited by 8 publications
(5 citation statements)
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“…Grain size is generally inferred from the SEM. As expected grain size increases with temperature, the average grain size is 100, 250, and 500 nm at substrate temperature of 480, 520, and 560 • C. Dong [12] reported that the gain size of polycrystalline GaSb films grown by MBE at 520 • C was about 250 nm, so here the grain size of thin films grown by co-evaporation appears as large as the results grown by MBE.…”
Section: Structural Property and Surface Morphology Of Polycrystallin...supporting
confidence: 68%
See 1 more Smart Citation
“…Grain size is generally inferred from the SEM. As expected grain size increases with temperature, the average grain size is 100, 250, and 500 nm at substrate temperature of 480, 520, and 560 • C. Dong [12] reported that the gain size of polycrystalline GaSb films grown by MBE at 520 • C was about 250 nm, so here the grain size of thin films grown by co-evaporation appears as large as the results grown by MBE.…”
Section: Structural Property and Surface Morphology Of Polycrystallin...supporting
confidence: 68%
“…The bulk crystal growth was focused on GaSb by different techniques: vertical feeding method (VFM) [5,6] to obtain polycrystalline ingots and Czochralski (CZ) [7−9] method to obtain monocrystalline ingots. The film growth is mainly focused on quaternary GaInAsSb on GaSb substrates by MOVPE [10] , MBE [11,12] or LPE [13−15] method.…”
Section: Introductionmentioning
confidence: 99%
“…GaSb is an important III-V semiconductor for detectors, semiconductor lasers, and thermophotovoltaic devices which operate in the mid-infrared range. [1] Organic metallic vapour phase epitaxy, [2] molecular beam epitaxy [3,4] and liquid phase epitaxy [5,6] have been utilized in the growth of GaSb material. All these methods are high processing cost technologies; one possibility of reducing the processing cost is the co-evaporation method.…”
Section: Introductionmentioning
confidence: 99%
“…12,14 The smaller resistivity in the polycrystalline samples could be caused by the so-called charge trapping effect, which is commonly observed in polycrystalline semiconductors. [34][35][36] It is known that the charge ͑electron or hole͒ can be easily trapped by defects and dangling bonds at the grain boundaries, and sometimes, the resistivity of the whole sample is reduced due to relatively high conducting channels in the grain boundaries, as reported in polycrystalline Ge ͑Ref. 34͒ and GaSb ͑Ref.…”
Section: Transport Propertiesmentioning
confidence: 99%