2021
DOI: 10.1016/j.jallcom.2020.157627
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Low-resistivity SrRuO3 thin films formed on SiO2 substrates without buffer layer by RF magnetron sputtering

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Cited by 8 publications
(3 citation statements)
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“…In particular, SRO can be epitaxially grown on SiO 2 /Si; 27,28) this makes it a useful material with which to connect Si electronics and oxide electronics and it may be able to overcome the limitations of existing electronics. Recently, researchers have tried growing high-quality SRO epitaxial films on SiO 2 /Si 27,29) with the goal of making dynamic random access memory 30) using SRO/SrTiO 3 (STO)/SRO high-k capacitors 25) on SiO 2 /Si. 28) Not only is high-quality epitaxial growth of SRO an essential issue from an engineering perspective; high-quality samples are indispensable for exploring the electronic states of SRO and understanding its transport properties and ferromagnetism.…”
Section: Introductionmentioning
confidence: 99%
“…In particular, SRO can be epitaxially grown on SiO 2 /Si; 27,28) this makes it a useful material with which to connect Si electronics and oxide electronics and it may be able to overcome the limitations of existing electronics. Recently, researchers have tried growing high-quality SRO epitaxial films on SiO 2 /Si 27,29) with the goal of making dynamic random access memory 30) using SRO/SrTiO 3 (STO)/SRO high-k capacitors 25) on SiO 2 /Si. 28) Not only is high-quality epitaxial growth of SRO an essential issue from an engineering perspective; high-quality samples are indispensable for exploring the electronic states of SRO and understanding its transport properties and ferromagnetism.…”
Section: Introductionmentioning
confidence: 99%
“…The SRO film had a low resistivity value of ∼600 μΩ•cm at a thickness of ∼40 nm, similar to resistivity values of SRO films deposited by sputtering or pulsed laser deposition. 23,24 The difference in resistance properties between SRO and ASRO films became more pronounced as the film thickness decreased; the sheet resistance of SRO films increased more steeply than that of ASRO films as the film thickness decreased. This difference could be ascribed to the different surface morphologies of the SRO and ASRO films.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…From these results, hexagonal or square surface lattice planes can lead to reasonable epitaxy of β-Ga 2 O 3 . Technically, SrRuO 3 (SRO) is considered as a pseudo-cubic structure with a compatibility to common ferroelectric materials, which is a type of deep work-function metal (5.2 eV) for the bottom electrode [28,29].…”
Section: Introductionmentioning
confidence: 99%