2006
DOI: 10.1063/1.2187576
|View full text |Cite
|
Sign up to set email alerts
|

Low specific contact resistance Ti∕Au contacts on ZnO

Abstract: Ti ∕ Au Ohmic contacts on heavily Al-doped (n∼1019cm−3) n-ZnO produce low specific contact resistivity of 2.4×10−7Ωcm2 in the as-deposited condition and extremely low minimum values of 6×10−8Ωcm2 after annealing at 300°C.The contact resistance is independent of measurement temperature after low temperature anneals, suggesting that tunneling is the dominant transport mechanism in the contacts. The contact morphology roughens after annealing at 150°C and Auger electron spectroscopy depth profiling shows Zn outdi… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
9
0

Year Published

2007
2007
2019
2019

Publication Types

Select...
6
2

Relationship

1
7

Authors

Journals

citations
Cited by 32 publications
(9 citation statements)
references
References 15 publications
0
9
0
Order By: Relevance
“…[8][9][10] To progress further in fabricating a ZnO-based optical-electronic device, robust stable p-type ZnO is highly demanded during fabrication processes, especially under thermal treatment. [8][9][10] To progress further in fabricating a ZnO-based optical-electronic device, robust stable p-type ZnO is highly demanded during fabrication processes, especially under thermal treatment.…”
Section: Introductionmentioning
confidence: 99%
“…[8][9][10] To progress further in fabricating a ZnO-based optical-electronic device, robust stable p-type ZnO is highly demanded during fabrication processes, especially under thermal treatment. [8][9][10] To progress further in fabricating a ZnO-based optical-electronic device, robust stable p-type ZnO is highly demanded during fabrication processes, especially under thermal treatment.…”
Section: Introductionmentioning
confidence: 99%
“…This result reveals that upon the thermal evaporation of the ZnS/Ge powders at 1000-1100°C, the upper limit of O 2 in Ar for the growth of Zn 2 GeO 4 NWs is below 1%. Because the formation enthalpy of GeO 2 , Ϫ132.2 kcal/mol, 16,17 is greater than that of Zn 2 GeO 4 , Ϫ5.5 kcal/mol, 10 and that of ZnO, Ϫ83 kcal/mol, 17,18 the higher oxygen partial pressure favors the growth of GeO 2 .…”
Section: Growth Of Zn 2 Geo 4 Nws In Ar and Ar/o 2 (1-3%mentioning
confidence: 99%
“…Conversely, the formation of oxygen vacancies near the ZnO surface can increase carrier concentration and lower specific contact resistance [19]. The TiO 2 /ZnO heterojunction is also of great importance for dye sensitised solar cells, [20,21], photocatalysis [22][23][24], watersplitting and self-cleaning coatings [25].…”
Section: Introductionmentioning
confidence: 99%