2003
DOI: 10.1143/jjap.42.1924
|View full text |Cite
|
Sign up to set email alerts
|

Low-Temperature Electrical Characteristics of Strained-Si MOSFETs

Abstract: A description, based on the notion of the super Drinfeld double, of non-Abelian duality for the (4, 4) supersymmetric sigma model is given. We show that this model has non-Abelian supercurrents that obey non-commutative conservation laws. The explicit formulae of general solutions to Poisson-Lie T duality with and without spectator superfields are given. The classical canonical equivalence to worldsheet (4, 4) supersymmetric sigma models related by Poisson-Lie T duality is explicitly formulated.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

2004
2004
2014
2014

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 13 publications
(2 citation statements)
references
References 17 publications
0
2
0
Order By: Relevance
“…However, it is not clear whether the mobility gain of strained-Si nMOSFETs is due to a gain in conduction mass [2,3] or to a reduced phonons scattering rate [4]. In this paper, we present a detailed analysis of mobility limiting mechanisms between process induced (uniaxial) and substrate induced (biaxial) strained nMOSFETs.…”
Section: Introductionmentioning
confidence: 98%
“…However, it is not clear whether the mobility gain of strained-Si nMOSFETs is due to a gain in conduction mass [2,3] or to a reduced phonons scattering rate [4]. In this paper, we present a detailed analysis of mobility limiting mechanisms between process induced (uniaxial) and substrate induced (biaxial) strained nMOSFETs.…”
Section: Introductionmentioning
confidence: 98%
“…Recently, Si:SiGe heterostructure MOSFETs have been studied over a wide temperature range in order to gain information on the physical processes involved in the operation of these devices, with a view to comparing them to their Si counterpart [2][3][4]. Low temperature operation of both Si and SiGe devices results in improved transconductance, reduction of leakage currents and decrease in subthreshold slopes.…”
Section: Introductionmentioning
confidence: 99%