Low-temperature growth of polycrystalline Si and Ge films by ultraviolet laser photodissociation of silane and germane

Andreatta, R. W.; Abele, C. C.; Osmundsen, J. F.; Eden, J. G.; Lubben, D.; Greene, J. E.

doi:10.1063/1.93001

Cited by 87 publications

(2 citation statements)

References 12 publications

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“…497,537,538,539,540 Early work on photo-assisted thin film deposition focused primarily on Hg sensitized photolytic chemical vapor deposition (CVD) methods. 498 However, Hg sensitized methods quickly fell out of favor due to both environmental, health, and metal contamination issues, 526 and the emergence of CO2 IR lasers 541 and a variety of halogen excimer UV lasers 542 that enabled both direct pyrolytic and photolytic CVD, respectively. 497 Beyond these initial beginnings, the evolution of photo-assisted deposition has largely followed and built upon the development and technical advancement associated with high-intensity lamps and lasers spanning the IR-visible-UV wavelength range.…”

Section: V32 Uv-assisted Film Depositionmentioning

confidence: 99%

Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models

Baklanov

Jousseaume

Рахимова

et al. 2019

Applied Physics Reviews

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This paper presents an in-depth overview of the application and impact of UV/VUV light in advanced interconnect technology. UV light application in BEOL historically was mainly motivated by the need to remove organic porogen and generate porosity in organosilicate (OSG) low-k films. Porosity lowered the film's dielectric constant, k, which enables one to reduce the interconnect wiring capacitance contribution to the RC signal delay in integrated circuits. The UV-based low-k film curing (λ > 200 nm) proved superior to thermal annealing and electron beam curing. UV and VUV light also play a significant role in plasma-induced damage to pSiCOH. VUV light with λ < 190–200 nm is able to break Si-CH3 bonds and to make low-k materials hydrophilic. The following moisture adsorption degrades the low-k properties and reliability. This fact motivated research into the mechanisms of UV/VUV photon interactions in pSiCOH films and in other materials used in BEOL nanofabrication. Today, the mechanisms of UV/VUV photon interactions with pSiCOH and other films used in interconnect fabrication are fairly well understood after nearly two decades of research. This understanding has allowed engineers to both control the damaging effects of photons and utilize the UV light for material engineering and nanofabrication processes. Some UV-based technological solutions, such as low-k curing and UV-induced stress engineering, have already been widely adopted for high volume manufacturing. Nevertheless, the challenges in nanoscaling technology may promote more widespread adoption of photon-assisted processing. We hope that fundamental insights and prospected applications described in this article will help the reader to find the optimal way in this wide and rapidly developing technology area.

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Section: V32 Uv-assisted Film Depositionmentioning

confidence: 99%

Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models

Baklanov

Jousseaume

Рахимова

et al. 2019

Applied Physics Reviews

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“…One -in situ doping -involves photodissociating the parent molecule for the dopant at the same time that the crystal is being grown. Germanium and silicon films have been doped, for example, by photodissociating GeH4 (or SiH4) and TMA simultaneously [8]. The more commonly used technique, however, is to ac complish two tasks with the laser.…”

Section: Dopingmentioning

confidence: 99%

Photochemical processing of semiconductors: New applications for visible and ultraviolet lasers

Eden

1986

IEEE Circuits Devices Mag.

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Laser photochemistry of organometallic compounds related to applications in microelectronics

Sato

1989

Applied Organom Chemis

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Photochemistry of organometallic compounds achieves a marriage of a rich variety of organometallic chemistry and the full potential of electronically excited states of molecules. The application of lasers as light sources adds a great many new features to these studies, which cannot be attained by other means, because lasers provide light of such a high quality, e.g. a high-intensity, energetic (i.e. wavelength) purity, a high degree of coherence, and a high spatial and temporal resolution. Laser photochemistry of organometallic compounds, such as laser photochemical vapor deposition (LPCVD), laser ablation, and photochemical dry etching, forms the basis of many important industrial processes which sustain the present-day microelectronics industries. Lasers are used not only to photodissociate organometallic molecules, but to monitor the reaction steps by probing the starting material, chemical intermediate, or final product by many laser-based spectroscopic methods. Although it is a very young area of science (the first laser was operated in lW), this research area is now really ebullient, as a result of strong interest from both the fundamental and the practical sides. Laser photochemistry of organometallic compounds extends a wide and fertile research frontier, full of challenge and novel possibilities. In the present review, the present status of laser (ultraviolet and visible) photochemistry of organometallic compounds related to these industrial applications is briefly reviewed, with special emphasis on the basic studies of the relevant photochemistry and their relationship to photochemical processes on solid surfaces.

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Low-temperature growth of polycrystalline Si and Ge films by ultraviolet laser photodissociation of silane and germane

Cited by 87 publications

References 12 publications

Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models

Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models

Photochemical processing of semiconductors: New applications for visible and ultraviolet lasers

Laser photochemistry of organometallic compounds related to applications in microelectronics

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