“…Most common processes to obtain SiC need high temperatures, around 1150-1500°C (10-17), using different techniques as "nanocasting" (10,11), sol-gel (12)(13), molten salts (14), carbothermic reduction (15)(16)(17) and low temperature processes as magnesiothermic reduction method (18)(19)(20)(21); these methods use different materials as silicon precursors: SiO 2 (9,10,16-18), TEOS (12,13); and carbon: polycarbosilane (10,11), phenolic resine (12,13) graphite (17), resorcinol-formaldehyde (18,19).…”