2015
DOI: 10.1021/acs.jpcc.5b05639
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Low-Temperature Reductive Coupling of Formaldehyde on Rutile TiO2(110)

Abstract: The formation and coupling of methylene upon dissociation of formaldehyde on reduced TiO 2 (110) are studied using variable temperature scanning tunneling microscopy (STM). In agreement with prior studies, formaldehyde preferably adsorbs on the bridging-bonded oxygen vacancy (V O ) defect site. V O -bound formaldehyde couples with Ti-bound formaldehyde forming a diolate species, which appears as the majority species on the surface at 300 K. Here, STM images directly visualize a low-temperature coupling reactio… Show more

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Cited by 19 publications
(35 citation statements)
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“…But it is considerably different from the phenomenon observed on rutile TiO 2 (110) [19,21,22], rutile TiO 2 (100)-(2×1) [29], and the reduced anatase TiO 2 (100)-(1×4) surfaces [27]. On these surfaces [19,21,22,27,29], two CH 2 O molecules can be coupled to form C 2 H 4 , and surface O v sites are identified as the reactive sites for the formation of C 2 H 4 . In our experiments, the rutile TiO 2 (100)-(1×1) surface used is annealed in >4×10 −7 Torr O 2 , and nearly no surface O v sites exist on the rutile TiO 2 (100)-(1×1) surface after sample preparation.…”
Section: A the Adsorption And Reactions Of Ch 2 O On The Rutile Tio mentioning
confidence: 73%
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“…But it is considerably different from the phenomenon observed on rutile TiO 2 (110) [19,21,22], rutile TiO 2 (100)-(2×1) [29], and the reduced anatase TiO 2 (100)-(1×4) surfaces [27]. On these surfaces [19,21,22,27,29], two CH 2 O molecules can be coupled to form C 2 H 4 , and surface O v sites are identified as the reactive sites for the formation of C 2 H 4 . In our experiments, the rutile TiO 2 (100)-(1×1) surface used is annealed in >4×10 −7 Torr O 2 , and nearly no surface O v sites exist on the rutile TiO 2 (100)-(1×1) surface after sample preparation.…”
Section: A the Adsorption And Reactions Of Ch 2 O On The Rutile Tio mentioning
confidence: 73%
“…As irradiation time increases, a peak at ∼580 K appears and increases in intensity. Based on previous works [17,19,21,22], this peak is due to desorption of C 2 H 4 product, which is formed via the carbon-carbon coupling of two CH 2 O moleules. Clearly, C 2 H 4 product is another source for the m/z=28 signal at 580 K. This is very similar to the observation of CH 2 O photodecomposition on the rutile TiO 2 (110) surface.…”
Section: B the Photocatalytic Reactions Of Ch 2 O On The Rutile Tio mentioning
confidence: 79%
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“…HCHO preferably adsorbed on the O vac sites, forming O vac -bound species and the intact HCHO diffused along the Ti row and then diffused to nearby O vac sites upon C-O bond dissociation. Afterward, this HCHO coupled with another HCHO located across the Ti row and desorbed as an ethylene molecule [55]. TMA diffusion tends to be forbidden at RT due to its chemical bond with the surface.…”
Section: Diffusionmentioning
confidence: 99%