2019
DOI: 10.1021/acsaem.9b00502
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Low-Temperature Screen-Printed Metallization for the Scale-Up of Two-Terminal Perovskite–Silicon Tandems

Abstract: Tandem photovoltaic devices based on perovskite and crystalline silicon (PK/c-Si) absorbers have the potential to push commercial silicon single junction devices beyond their current efficiency limit. However, their scale-up to industrially relevant sizes is largely limited by current fabrication methods which rely on evaporated metallization of the front contact instead of industry standard screen-printed silver grids. To tackle this challenge, we demonstrate how a low-temperature silver paste applied by a sc… Show more

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Cited by 92 publications
(88 citation statements)
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“…The detailed preparation procedure can be found elsewhere. 85 As shown in the ESI, † Fig. S21, the Cs 0.17 -FA 0.83 Pb(I 0.83 Br 0.17 ) 3 perovskite absorber is more stable than MAPbI 3 :MABr (2.5 mg ml À1 ) and FAPbI 3 :MABr (10 mg ml À1 ) under the same HLS conditions.…”
Section: Compositional Dependent Stabilitymentioning
confidence: 85%
“…The detailed preparation procedure can be found elsewhere. 85 As shown in the ESI, † Fig. S21, the Cs 0.17 -FA 0.83 Pb(I 0.83 Br 0.17 ) 3 perovskite absorber is more stable than MAPbI 3 :MABr (2.5 mg ml À1 ) and FAPbI 3 :MABr (10 mg ml À1 ) under the same HLS conditions.…”
Section: Compositional Dependent Stabilitymentioning
confidence: 85%
“…8), with a remarkable FF close to 82%. This record efficiency for such solar cell was obtained without any masking step or photolithography and uses a low-temperature Ag screenprinted metallization causing ~3% shadowing [45], [53] [54].…”
Section: Optimized Moox Contact Design For Record Performancementioning
confidence: 99%
“…Following these considerations, we vary here the thicknesses of the (i)a-Si:H and MoOx layers in SHJ devices and discuss their influence on the optical and electrical performance of the cell. Furthermore, a low temperature curing paste is employed to avoid degradation and to assess the potential of this contact strategy using state-of-the-art SHJ processing [40] [45]. Fig.…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, they can also act as excellent barriers to prevent damages induced by metal diffusion and outside moisture and inside halogen. [248][249][250][251][252][253][254] However, proper buffer layers are required to protect the under layers when sputter ITO or (indium zinc oxide) IZO as electrodes in semitransparent PSCs and tandem PSCs due to the strong power of sputtering. Boyd et al deposited an impermeable ITO layer on the top of PCBM layer.…”
Section: Stable Nonmetal Electrodes As Barriersmentioning
confidence: 99%