Tandem devices combining perovskite and silicon solar cells are promising candidates to achieve power conversion efficiencies above 30% at reasonable costs. State-of-the-art monolithic two-terminal perovskite/silicon tandem devices have so far featured silicon bottom cells that are polished on their front side to be compatible with the perovskite fabrication process. This concession leads to higher potential production costs, higher reflection losses and non-ideal light trapping. To tackle this issue, we developed a top cell deposition process that achieves the conformal growth of multiple compounds with controlled optoelectronic properties directly on the micrometre-sized pyramids of textured monocrystalline silicon. Tandem devices featuring a silicon heterojunction cell and a nanocrystalline silicon recombination junction demonstrate a certified steady-state efficiency of 25.2%. Our optical design yields a current density of 19.5 mA cm thanks to the silicon pyramidal texture and suggests a path for the realization of 30% monolithic perovskite/silicon tandem devices.

Combining market-proven silicon solar cell technology with an efficient wide band gap top cell into a tandem device is an attractive approach to reduce the cost of photovoltaic systems. For this, perovskite solar cells are promising high-efficiency top cell candidates, but their typical device size (<0.2 cm 2 ), is still far from standard industrial sizes. We present a 1 cm 2 near-infrared transparent perovskite solar cell with 14.5% steadystate efficiency, as compared to 16.4% on 0.25 cm 2 . By mechanically stacking these cells with silicon heterojunction cells, we experimentally demonstrate a 4-terminal tandem measurement with a steady-state efficiency of 25.2%, with a 0.25 cm 2 top cell. The developed top cell processing methods enable the fabrication of a 20.5% efficient and 1.43 cm 2 large monolithic perovskite/silicon heterojunction tandem solar cell, featuring a rear-side textured bottom cell to increase its near-infrared spectral response. Finally, we compare both tandem configurations to identify efficiency-limiting factors and discuss the potential for further performance improvement.

Perovskite/silicon tandem solar cells are increasingly recognized as promi­sing candidates for next‐generation photovoltaics with performance beyond the single‐junction limit at potentially low production costs. Current designs for monolithic tandems rely on transparent conductive oxides as an intermediate recombination layer, which lead to optical losses and reduced shunt resistance. An improved recombination junction based on nanocrystalline silicon layers to mitigate these losses is demonstrated. When employed in monolithic perovskite/silicon heterojunction tandem cells with a planar front side, this junction is found to increase the bottom cell photocurrent by more than 1 mA cm−2. In combination with a cesium‐based perovskite top cell, this leads to tandem cell power‐conversion efficiencies of up to 22.7% obtained from J–V measurements and steady‐state efficiencies of up to 22.0% during maximum power point tracking. Thanks to its low lateral conductivity, the nanocrystalline silicon recombination junction enables upscaling of monolithic perovskite/silicon heterojunction tandem cells, resulting in a 12.96 cm2 monolithic tandem cell with a steady‐state efficiency of 18%.

Tandem photovoltaic devices based on perovskite and crystalline silicon (PK/c-Si) absorbers have the potential to push commercial silicon single junction devices beyond their current efficiency limit. However, their scale-up to industrially relevant sizes is largely limited by current fabrication methods which rely on evaporated metallization of the front contact instead of industry standard screen-printed silver grids. To tackle this challenge, we demonstrate how a low-temperature silver paste applied by a screen-printing process can be used for the front metal grid of two-terminal perovskite–silicon tandem structures. Small-area tandem devices with such printed front metallization show minimal thermal degradation when annealed up to 140 °C in air, resulting in silver bulk resistivity of <1 × 10–5 Ω·cm. This printed metallization is then exploited in the fabrication of large area PK/c-Si tandems to achieve a steady-state efficiency of 22.6% over an aperture area of 57.4 cm2 with a two-bus bar metallization pattern. This result demonstrates the potential of screen-printing metal contacts to enable the realization of large area PK/c-Si tandem devices.

For crystalline-silicon solar cells, voltages close to the theoretical limit are nowadays readily achievable when using passivating contacts. Conversely, maximal current generation requires the integration of the electron and hole contacts at the back of the solar cell to liberate its front from any shadowing loss. Recently, the world-record e ciency for crystalline-silicon singlejunction solar cells was achieved by merging these two approaches in a single device; however, the complexity of fabricating this class of devices raises concerns about their commercial potential. Here we show a contacting method that substantially simplifies the architecture and fabrication of back-contacted silicon solar cells. We exploit the surface-dependent growth of silicon thin films, deposited by plasma processes, to eliminate the patterning of one of the doped carrier-collecting layers. Then, using only one alignment step for electrode definition, we fabricate a proof-of-concept 9-cm 2 tunnel-interdigitated backcontact solar cell with a certified conversion e ciency >22.5%. I n recent decades, the market of photovoltaics has been consistently growing and the yearly installed photovoltaic capacity has increased from 328 MW peak in 2001 to 50 GW peak in 2015. This resulted in 2016 in a cumulative capacity of 235 GW peak (ref. 1), largely based on crystalline-silicon (c-Si) solar-cell technologies 2 , and contributing to about 1.3% of the global electricity production 3 . To further increase this number, the cost-competitiveness of photovoltaics must surpass that of classic, non-renewable energy sources, and one route towards this goal is to raise the conversion efficiency of industrial c-Si solar cells 4,5 .High power conversion efficiencies require maximizing the solar-cell electrical parameters: open-circuit voltage (V oc ), fillfactor (FF) and short-circuit current density (J sc ). For the V oc and FF, this is possible by using passivating contacts, employing silicon oxide or hydrogenated amorphous silicon (a-Si:H) thin films to minimize charge carrier recombination at the electrical contacts to the c-Si wafer, with demonstrated record efficiencies for two-sidecontacted solar cells of 25.1% (refs 6,7). Maximum J sc values can be achieved using a back-contacted architecture, eliminating front metal electrode shadowing and minimizing optical reflection and absorption losses at the front. Small-sized back-contacted solar cells, based on diffused silicon homo-junctions, were realized at several research institutes (refs 8-11), showing a best conversion efficiency up to 24.4% (ref. 12). Industrially, the back-contacted architecture was pioneered by Sunpower, recently reporting on large-area devices with very high J sc values and efficiencies surpassing 25% (ref. 13). Considering these achievements, integrating passivating contacts in a back-contacted architecture is the obvious c-Si single-junction solar-cell design towards highest conversion efficiencies. Such an approach has increasingly been researched in both academia and indust...