2013
DOI: 10.1109/led.2013.2263193
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Low-Voltage Double-Gate ZnO Thin-Film Transistor Circuits

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Cited by 32 publications
(8 citation statements)
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“…Two-dimensional (2D) crystalline nanomaterials have generated widely growing interest for diverse applications on mechanically soft flexible substrates owing to their generally inert surface, high elasticity, and thickness scalability down to a monolayer, which represents the ideal limit for electrostatic control, optical transparency, and bendability. Over the past decade, graphene has been the foremost 2D atomic crystal investigated for flexible nanoelectronics with substantial advances in large-scale synthesis, device mobility, cutoff frequency, strain tolerance, and mechanical robustness. , However, its lack of a bandgap results in a transistor that cannot be switched off by a gate voltage, an indispensable requirement for the vast majority of circuits in modern electronic systems . Recently, transitional metal dichalcogenides (TMDs) such as MoS 2 and WSe 2 have emerged as suitable layered semiconductors that offer a sizable bandgap attractive for low-power electronics. ,,,, Nonetheless, despite promising theoretical prospects, , experimental TMD device mobilities have been relatively low, less than 50 cm 2 /V·s on flexible substrates so far, , a value comparable to established amorphous materials such as metal oxide semiconductors that have transitioned into application products. …”
Section: Resultsmentioning
confidence: 99%
“…Two-dimensional (2D) crystalline nanomaterials have generated widely growing interest for diverse applications on mechanically soft flexible substrates owing to their generally inert surface, high elasticity, and thickness scalability down to a monolayer, which represents the ideal limit for electrostatic control, optical transparency, and bendability. Over the past decade, graphene has been the foremost 2D atomic crystal investigated for flexible nanoelectronics with substantial advances in large-scale synthesis, device mobility, cutoff frequency, strain tolerance, and mechanical robustness. , However, its lack of a bandgap results in a transistor that cannot be switched off by a gate voltage, an indispensable requirement for the vast majority of circuits in modern electronic systems . Recently, transitional metal dichalcogenides (TMDs) such as MoS 2 and WSe 2 have emerged as suitable layered semiconductors that offer a sizable bandgap attractive for low-power electronics. ,,,, Nonetheless, despite promising theoretical prospects, , experimental TMD device mobilities have been relatively low, less than 50 cm 2 /V·s on flexible substrates so far, , a value comparable to established amorphous materials such as metal oxide semiconductors that have transitioned into application products. …”
Section: Resultsmentioning
confidence: 99%
“…Two dimensional (2D) atomic layered semiconductors have been widely studied as promising candidates for flexible nanosystems with functionalities ranging from sensing to wireless communication owing to their compelling electrical, optical, and mechanical properties, including ultimate thickness scalability down to one atomic layer, ideal electrostatic control, and superior mechanical flexibility with strain limit >20%. As the most studied 2D layered nanomaterial, graphene with high carrier mobilities (∼10 000 cm 2 /(V·s) at room temperature) is most promising for ultrahigh-frequency analog nanosystems, such as terahertz detectors. , The zero bandgap semimetal nature of graphene, however, results in low field-effect modulation and high OFF state current limiting its applications for logic and low power nanoelectronics. On the other hand, semiconducting transition metal dichalcoginides (TMDs) offer sizable band gaps with large ON/OFF current ratio (∼10 7 ) that is favorable for low power electronics and digital circuits.…”
Section: Resultsmentioning
confidence: 99%
“…The oxygen deficiency can be easily controlled by the channel fabrication process conditions such as oxygen partial pressure during deposition/postannealing process, but these conventional techniques are difficult to selectively fabricate D-mode TFT next to E-mode device. To electively fabricate D-mode TFTs, several approaches have been proposed, including the control of channel compositions [31,35], the channel layer thickness control [25], local laser annealing [34], the use of different gate electrode materials, the formation of capping layer [33,40], low-k/high-k double gate oxide, top-gated structure, dual-gated structure [32] etc. Moreover, the fabrication of D-mode TFT by utilizing device degradation processes such as bias stress [30], light-irradiation [47], etc.…”
Section: Oxide-tft-based Nmos Invertermentioning
confidence: 99%