2002
DOI: 10.1007/978-0-387-35597-9_24
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Low-Voltage Embedded-RAM Technology: Present and Future

Abstract: Abstract:First, key issues for low-voltage «IV) embedded RAMs are summarized in terms of stable operation, suppression of leakage (gate-tunneling/subthreshold) currents, and speed variation of memory cells and peripheral logic circuits. Next, DRAM and SRAM cells to cope with the above issues, the circuit design focusing on subthreshold-current issue, and suppression of or compensation for design-parameter variations to reduce the speed variations are discussed. Voltage converters and power management for low-p… Show more

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Cited by 8 publications
(18 citation statements)
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“…1) [2]. Here, the dual-V DD and dual-tox device approach has been maintained with a MOSFET that has a thicker-tox and higher V T for the higher-V DD I/O circuitry.…”
Section: A Trends In Gate-oxide Thicknessmentioning
confidence: 99%
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“…1) [2]. Here, the dual-V DD and dual-tox device approach has been maintained with a MOSFET that has a thicker-tox and higher V T for the higher-V DD I/O circuitry.…”
Section: A Trends In Gate-oxide Thicknessmentioning
confidence: 99%
“…The substrate forward biasing recently proposed [6] achieves a larger V Tchange for a given V SUB -swing, even though the forward bias is strictly limited to less than 0.4V due to a rapid increase in the substrate current. The required V SUB swing, however, is as large as 1-3 V (Fig.5(b)) [2] and this approach becomes less effective with device scaling [7]. This is beacause of the smaller body constant, enhanced short-channel effects, and increases in other leakage currents such as the gate-induced drain-lowering (GIDL) current [7].…”
Section: Peripheral Logic Circuitsmentioning
confidence: 99%
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