A novel lateral Ge=Si avalanche photodiode without a charge region is investigated herein using device physical simulation. High field is provided by the band-gap barrier and build-in field at the Ge=Si interface in the vertical direction. Modulating the Si mesa thickness (0 0:4 m) and impurity concentration of the intrinsic Si substrate (1 10 16 4 10 16 cm 3 ) strengthens the electric field confinement in the substrate region and provides a high avalanche multiplication in the Si region. When the Si mesa thickness is 0:3 m, and the impurity concentration of the Si substrate is 2 10 16 cm 3 , the Lateral Avalanche PhotoDiode (LAPD) exhibits a peak gain of 246 under 1:55 m incident light power of 22:2 dBm, which increases with decreasing light intensity.