“…Due to their wide and direct band gap energy between 3.4 eV (GaN) and 6.2 eV (AlN) [1], Al x Ga 1Àx N alloys are promising materials for applications in deep ultraviolet (UV) devices, such as UV photodetectors [2,3], especially solar-blind photodetectors [4] as well as UV light-emission diodes (LEDs) with peak emission wavelengths from 250 to 340 nm [5][6][7][8]. However, techniques for fabricating highquality Al-rich AlGaN films are not mature up to now, due to lack of lattice and thermal matched substrates and inherent Al chemical activity.…”