2005
DOI: 10.1016/j.jcrysgro.2005.02.003
|View full text |Cite
|
Sign up to set email alerts
|

LP MOVPE growth and characterization of high Al content AlxGa1−xN epilayers

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

2
12
0

Year Published

2007
2007
2019
2019

Publication Types

Select...
7

Relationship

1
6

Authors

Journals

citations
Cited by 13 publications
(14 citation statements)
references
References 25 publications
2
12
0
Order By: Relevance
“…However, in our experiment, Al composition in AlGaN showed significant positive deviation from the linear relationship with the gas phase ratio, as shown in Fig. 1, where previous results from other groups were included for comparison [6][7][8][9][10][11]. In this work, we report the origin of such compositional deviation in terms of a thermodynamic model.…”
Section: Introductionsupporting
confidence: 47%
“…However, in our experiment, Al composition in AlGaN showed significant positive deviation from the linear relationship with the gas phase ratio, as shown in Fig. 1, where previous results from other groups were included for comparison [6][7][8][9][10][11]. In this work, we report the origin of such compositional deviation in terms of a thermodynamic model.…”
Section: Introductionsupporting
confidence: 47%
“…Therefore, there still exists an extensive room for us to further reduce TDs. where E g (GaN) ¼ 3.4 eV, E g (AlN) ¼ 6.2 eV [1], the experimental band gap bowing parameter b is 0.7597770.06085 eV and Al compositions (x) are estimated by XRD results in Fig. 1.…”
Section: Resultsmentioning
confidence: 99%
“…Recently, AlGaN materials have attracted much interest in the fields of ultraviolet (UV) photodetectors, especially solar-blind photodetectors [1][2][3][4] as well as high-brightness UV light-emitting diodes (LEDs) [5,6]. In most of cases, GaN or Ga-rich AlGaN epilayer has typically been used as an underlying buffer for Al-rich AlGaN.…”
Section: Introductionmentioning
confidence: 99%
“…Due to their wide and direct band gap energy between 3.4 eV (GaN) and 6.2 eV (AlN) [1], Al x Ga 1Àx N alloys are promising materials for applications in deep ultraviolet (UV) devices, such as UV photodetectors [2,3], especially solar-blind photodetectors [4] as well as UV light-emission diodes (LEDs) with peak emission wavelengths from 250 to 340 nm [5][6][7][8]. However, techniques for fabricating highquality Al-rich AlGaN films are not mature up to now, due to lack of lattice and thermal matched substrates and inherent Al chemical activity.…”
Section: Introductionmentioning
confidence: 99%