2002
DOI: 10.1117/12.469256
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<title>Array of holographic phase microelements providing given light patterns in the near field</title>

Abstract: The paper considers research and development of arrays of computergenerated multiple-focus phase microholograms for providing given light patterns in the near field zone. Peculiarities of such arrays are discussed. The main result of the talk is the fabrication of the microhologram array providing the given complex image in the focal plane The size of array was 1.54 mm x 1.54 mm, the size of each microhologram was 0.192 mm x 0.192 mm, and focal length -2 mm.

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Cited by 1 publication
(3 citation statements)
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“…Therefore we used the specially developed method of direct electron beam recording of phase relief in electronic resist layer with the subsequent chemical and plasmachemical development (etching) [2]. This method is based on the dosed out electronic irradiation of phase areas thus forming the various set of depths after development.…”
Section: Experimental Techniques Of Holographic Elements and Rastersmentioning
confidence: 99%
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“…Therefore we used the specially developed method of direct electron beam recording of phase relief in electronic resist layer with the subsequent chemical and plasmachemical development (etching) [2]. This method is based on the dosed out electronic irradiation of phase areas thus forming the various set of depths after development.…”
Section: Experimental Techniques Of Holographic Elements and Rastersmentioning
confidence: 99%
“…2). For the sake of elimination of possible output light distribution deterioration because of neighbouring microholograms distributions overlapping in focal plane, in course of synthesis of each separate microhologram it is necessary to define output distribution by using only the central part of size ɋɯɋ of the readout grid MxM in focal plane [2]:…”
Section: Calculation Of Rasters Of Holographic Microcellsmentioning
confidence: 99%
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