<title>Grating line shape characterization using scatterometry</title>

The method for testing effectiveness of holographic security devices

“…The method requires application of a laser in order to illuminate particular points of the OVG surface so the measurements are carrying out at several points by means of the scanning system. To obtain the foil profile parameters complicated calculations aimed at solution of the light diffraction inverse problem 3,4,5,6 are to be made. Measurements of the diffraction field upon a transparent holographic foil can be difficult to do because of low level of the reflected radiation power.…”

<title>Simulation of linearity in optical microscopes</title>

“…Perform a fit between measured values Mi and the true values Ti. So, we have T=aM+b+E (6) where a and b are chosen to minimize: S=MaxE) (7) So the cost function S is the absolute worst error after performing the best linear fit to the data. S will depend on the microscope type, the measurement algorithm used, as well as the measurement algorithm's parameter set fw}.…”

193 nm angle-resolved scatterfield microscope for semiconductor metrology

“…Many alternative methods have been developed to overcome this limitation, such as scatterometry, confocal microscopy, etc. [1][2][3][4][5] Recently, scatterfield microscopy has demonstrated a potential for improving optical measurement sensitivity and performance. [3][4][5] Scatterfield microscopy combines scatterometry and bright-field optical microscopy, and features Köhler illumination so that an off-axis point in the back focal plane (BFP) of an objective lens makes a plane wave illuminating the sample plane at a specific angle.…”