1995
DOI: 10.1117/12.213751
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<title>Laser-induced damage in optical materials under UV excimer laser radiation</title>

Abstract: The studies of laser damage resistance o silica glass and.fluoride crystals (MgF2, OaF2 and LIE), perrormed at the wavelengths of excimer lasers Ar (193nrn), KrF (248nm), and. XeF (353rim) with the pulse duration SOns have given the following set of data:-the dependence o1 the bulk damage threshold on irradiated spot size , ranging in value from 6 to I 20OtLm;-temperature dependence of laser damage resistance;-the influence o metal admixtures on damage threshold; -the influence o ionizing radiation on damage r… Show more

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“…This cleavage of functional groups and the breaking of bonds is the result of a process of nonlinear photon absorption, where two or more photons are absorbed into a chemical bond, which is subsequently disrupted. The consequence of this destruction of bonds can be an increase in porosity but also the destruction of optical instruments [23].…”
Section: Introductionmentioning
confidence: 99%
“…This cleavage of functional groups and the breaking of bonds is the result of a process of nonlinear photon absorption, where two or more photons are absorbed into a chemical bond, which is subsequently disrupted. The consequence of this destruction of bonds can be an increase in porosity but also the destruction of optical instruments [23].…”
Section: Introductionmentioning
confidence: 99%