<title>Micro-optic fabrication using one-level gray-tone lithography</title>

Error analysis of digital virtual mask fabrication technique

“…In the field of micro-optics, the gray-scale mask technique [5][6][7] and the direct writing technique [8] are developed to avoid the alignment error. But with the increase of steps, it is difficult to fabricate the gray-scale mask and the fabrication cost will be greatly promoted [9]. Using the direct writing technique, the fabrication efficiency is low.…”

<title>Progress in gray-tone lithography and replication techniques for different materials</title>

“…1). Some activities have been initiated in this area during the last years [1][2][3][4][5][6]. Using technique local variations of light intensity are produced which lead to predetermined curved resist profiles.…”

“…This paper reports on progress in graytone lithography using subresolution pixeled chromium glass masks and introduces some replication techniques for different materials. In continuation of our work on graytone lithography, reported elsewhere [5,6], detailed view on reproducibility, fidelity and process latitude will be presented. Based on this results infrared diffractive optical elements have been fabricated in silicon using an 1 : I dry etching process, where the surface roughness of the shaped areas after etching has an 1 a value of I 8 nm.…”

Negative Pattern Formation in Positive Resist Layer by EB / UV Hybrid Lithography

“…In this regard, many researchers have attempted to realize the functional three dimensional structure in order to apply to various fields. [1][2][3][4][5] The well-known the grayscale lithography is usually implemented using gray-tone masks, letting varying amounts of light pass through, which are of great potential use in miniaturization industries as they allow for the mass production of micromachine with varying topography. [2] The double patterning, well known [3], allows a larger lithography period than direct patterning techniques, thus increasing the process stability.…”

“…[1][2][3][4][5] The well-known the grayscale lithography is usually implemented using gray-tone masks, letting varying amounts of light pass through, which are of great potential use in miniaturization industries as they allow for the mass production of micromachine with varying topography. [2] The double patterning, well known [3], allows a larger lithography period than direct patterning techniques, thus increasing the process stability. The stereolithography utilizes focused light spot scanning over the photo curable resin surface and then a light induce photo closslink occurs, constructing solid micro structures.…”