&lt;title&gt;Optical transceiver in integrated and micro-optics on silicon&lt;/title&gt;

Heider, Hans Joachim; Dahms, Ulf-Peter; Mahnke, Matthias; Bludszuweit, M.; Mueller, Joerg

doi:10.1117/12.382156

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MEMS on silicon for integrated optic metrology and communication systems

Müller

2003

Microsystem Technologies

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Integrated optic micro-electromechanical systems (IO-MEMS) based on silicon-, Al 2 O 3 -SiO 2 and TiO 2 -SiO 2 waveguides, doped with Ti, Cr, and Er on silicon substrates allow to generate complex metrology and optical communication systems. They exhibit low loss across a wide spectral range, occupy small space, and exhibit high functionality at low production cost. The waveguides are deposited by CVD and patterned by anisotropic plasma etching. The micro-electromechanical structures are formed by standard micro-machining processes and anodic bonding of silicon-glass. An integrated optical pressure sensor using the interferometer principle, a gas monitor for the near and middle infrared using elevated silicon single mode waveguides, an electrostatic-tuned Ti:/Cr:-sapphire laser, and a UV-VIS-NIR-spectrometer including integrated broad banded light sources represent metrology systems. Optical communication systems are described like a waveguide grating based wavelength demultiplexer, an optical transceiver using self aligned detector and emitter as well as a tapered fibre coupler, and an integrated optical amplifier.

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