&lt;title&gt;Overlay Precision For Micron Lithography&lt;/title&gt;

Underhill, J. A.

doi:10.1117/12.954838

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Mask Distortion By Bending1

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1979

2023

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“…The lenoth change AL according to equation (2) shows a pronounced variation with the distance a of the support points from the ends of the mask (Eig. 4).…”

Section: Mask Distortion By Bendingmentioning

confidence: 99%

PTB activities for the calibration of two-dimensional length standards for microlithography

Haessler-Grohne,

Kunzmann,

Probst

2023

Bay Area Chrome Users Society Symposium 1988

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The PTB has initiated a project to establish a length comparator for two-dimensional long-distance calibration of photomask standards. The new LMS 2000 mask measuring machine of the Ernst Leitz Wetzlar GmbH has been installed for this purpose.The aim is to calibrate mask standards absolutely, i.e. in terms of meter units, in a range of 200 mm x 200 mm with an uncertainty of about 20 nm x 20 nm. It is intended to develop methods for the on-line correction of errors which are due to machine characteristics, laser interferometer parameters, temperature variations and dimensioned oroperties of the mask. The fundamental metrological problems encountered in high-precision length calibration in one and two dimensions are presented. A short report on the state of our work and an outlook on future steps will be given.

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“…The lenoth change AL according to equation (2) shows a pronounced variation with the distance a of the support points from the ends of the mask (Eig. 4).…”

Section: Mask Distortion By Bendingmentioning

confidence: 99%