Monochromatic x-ray backlighting has been employed with great success for imaging of plasmas with strong self-emission such as x-pinches and wire array z-pinches. However, implementation of a monochromatic backlighting system typically requires extremely high quality spherically bent crystals which are difficult to manufacture and can be prohibitively expensive. Furthermore, the crystal must have a direct line of sight to the object, which typically emits copious amounts of radiation and debris. We present a quasimonochromatic x-ray backlighting system which employs an elliptically bent mica crystal as the dispersive element. In this scheme a narrow band of continuum radiation is selected for imaging, instead of line radiation in the case of monochromatic imaging. The flat piece of mica is bent using a simple four-point bending apparatus that allows the curvature of the crystal to be adjusted in situ for imaging in the desired wavelength band. This system has the advantage that it is very cost effective, has a large aperture, and is extremely flexible. The principles of operation of the system are discussed and its performance is analyzed.