1981
DOI: 10.1103/physrevb.23.2923
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Macroscopic theory of pulsed-laser annealing. I. Thermal transport and melting

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Cited by 444 publications
(114 citation statements)
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“…The first one is the crossover between the regime of solute segregation and the regime of solute trapping, which sets in as the pulling velocity, V , is increased. The good quantitative agreement of our estimates for the segregation coefficient, k(V ), with existing theories [11][12][13] confirmed that MD is a valuable simulation tool for DS. The second point is the advection of the liquid phase towards the solidification front.…”
Section: Discussionsupporting
confidence: 83%
See 1 more Smart Citation
“…The first one is the crossover between the regime of solute segregation and the regime of solute trapping, which sets in as the pulling velocity, V , is increased. The good quantitative agreement of our estimates for the segregation coefficient, k(V ), with existing theories [11][12][13] confirmed that MD is a valuable simulation tool for DS. The second point is the advection of the liquid phase towards the solidification front.…”
Section: Discussionsupporting
confidence: 83%
“…As a consequence, some solute is trapped in the solid and segregation at the interface is lowered. Several models have been proposed to describe solute-trapping [11][12][13]. The usual qualitative criterion for segregation is to compare two different characteristic times.…”
Section: B Segregation Coefficientmentioning
confidence: 99%
“…The energy of the excited states is relaxed to lattice vibration states within the time on the order of 10 −12 s [9]. In the case of ns-order pulsed laser irradiation, lattice heat is, therefore, the most important interaction [10]. The heat energy generated at the surface region caused by light absorption diffuses into interior regions of silicon films.…”
Section: Laser-induced Heating Followed By Melting Of Silicon and Germentioning
confidence: 99%
“…The high heat-diffusion coefficient of silicon allows heat diffusion into the underlying substrates. The heating characteristics of silicon films therefore depend on the thermal properties of the substrates [10,11]. In a case of silicon films formed on glass substrates, heating properties of the silicon films such as the threshold energy density for crystallization are therefore governed by the heat diffusivity, the density and the specific heat of the glass substrates.…”
Section: Laser-induced Heating Followed By Melting Of Silicon and Germentioning
confidence: 99%
“…This energy cascade depends mainly on relaxation times as well as heat capacities of carriers, LO phonons, and acoustic phonons. The physical properties of semiconductors taken from open literatures 1,5,6,9,12,[14][15][16][17][18][19][20][21] are listed in Table 1. The finite difference method with fully implicit scheme is used for discretizing the set of governing equations, and numerical accuracy is the second order for spatial and transient terms.…”
Section: Governing Equations and Computational Detailsmentioning
confidence: 99%