2015
DOI: 10.1016/j.surfcoat.2015.09.013
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Magnetic field argon ion filtering for pulsed magnetron sputtering growth of two-dimensional MoS2

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Cited by 18 publications
(13 citation statements)
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“…More recently, sputtering has been refined to meet the needs of the semiconductor industry and can produce large area monolayer sheets of MoS 2 onto appropriate substrates such as thermally oxidized silicon wafers. 18 A general approach to incorporating various d-block metals into molybdenum disulfide is outlined by Stupp, and cosputtering with targets of the appropriate metal and molybdenum disulfide at 190 °C under argon flow is used to produce alloyed films. 19 The influence of dopant on frictional characteristics of the films formed indicates a beneficial effect of the lighter transition metals, with Co, Cr, and Ni yielding films with a stable frictional response and a reduced wear rate.…”
Section: Transition Metal Dopingmentioning
confidence: 99%
See 1 more Smart Citation
“…More recently, sputtering has been refined to meet the needs of the semiconductor industry and can produce large area monolayer sheets of MoS 2 onto appropriate substrates such as thermally oxidized silicon wafers. 18 A general approach to incorporating various d-block metals into molybdenum disulfide is outlined by Stupp, and cosputtering with targets of the appropriate metal and molybdenum disulfide at 190 °C under argon flow is used to produce alloyed films. 19 The influence of dopant on frictional characteristics of the films formed indicates a beneficial effect of the lighter transition metals, with Co, Cr, and Ni yielding films with a stable frictional response and a reduced wear rate.…”
Section: Transition Metal Dopingmentioning
confidence: 99%
“…Sputtering has also been extensively researched as a route to MoS 2 and WS 2 films, , as has pulsed laser evaporation, , and both methods use targets of the material to be deposited as a thin film and as such are easily adaptable for incorporation of dopants by adding extra targets and codepositing. More recently, sputtering has been refined to meet the needs of the semiconductor industry and can produce large area monolayer sheets of MoS 2 onto appropriate substrates such as thermally oxidized silicon wafers …”
Section: Transition Metal Dopingmentioning
confidence: 99%
“…[40][41][42][43][44] However, with a relatively large band gap (≈2.7 eV) and the existence of contact resistance between the nanosheets, g-C 3 N 4 exhibits a poor electrical conductivity and low photocatalytic activity owing to the rapid recombination of photogenerated electron-hole pairs. [61][62][63] For the applications of MoS 2 in photocatalytic H 2 production, since only its edges have a high catalytic activity, whereas its basal plane is inactive, a low photocatalytic activity has been achieved, even for single-layer MoS 2 . To this end, the hybridization of g-C 3 N 4 with other functional materials, including fullerenes, has been developed in recent years and appears feasible since the polymeric nature of g-C 3 N 4 renders the chemical structure flexible.…”
Section: Introductionmentioning
confidence: 99%
“…The inorganic transition‐metal dichalcogenides (TMDs) represent another type of emerging 2D semiconducting nanomaterial and have been attracting widespread attention due to their intriguing electronic, optical, and mechanical properties . MoS 2 , consisting of hexagonal rings with Mo and S atoms alternately located at the hexagon corners, is the most representative TMD with a direct band gap in monolayer form and high in‐plane carrier mobility, thus being suitable for versatile applications in electro and photocatalysis, photovoltaics, and photoelectric devices . For the applications of MoS 2 in photocatalytic H 2 production, since only its edges have a high catalytic activity, whereas its basal plane is inactive, a low photocatalytic activity has been achieved, even for single‐layer MoS 2 .…”
Section: Introductionmentioning
confidence: 99%
“…This type of sputtering is called magnetron sputtering, and it can be used to sputter any film, regardless of its melting temperature. Magnetron sputtering has been used to deposit both MoS 2 [ 181 , 182 ] and WS 2 films [ 183 ]. The major concern with sputtered 2D films is that the material which is deposited is polycrystalline and often sub-stoichiometric [ 181 ].…”
Section: Fabrication and Working Principle Of 2d-material-based Gas S...mentioning
confidence: 99%