“…For example, deposition parameters that have been the foci of optimization studies include the choice of substrate (Hylton et al, 1993), substrate temperature (Xu et al, 2013a;Wei et al, 2020), working gas type and pressure , postdeposition annealing (Borisov et al, 2013), laser process conditions (Yu et al, 2020), and film thickness (Sun et al, 2016). Several common deposition techniques are available to obtain hexaferrite films of various crystallographic quality, including sol-gel , molecular beam epitaxy (MBE) (Liu et al, 2010), liquid phase epitaxy (LPE) (Kranov et al, 2006;Wu et al, 2020), screen printing (Chen et al, 2006), radio frequency (RF) magnetron sputtering (Zhang et al, 2010;Xu et al, 2013a;Patel et al, 2018;Abuzir et al, 2020), direct current (DC) magnetron sputtering (Zhang et al, 2014;Zhang et al, 2019), spin-coating (Meng et al, 2014a;Meng et al, 2014b), and pulsed laser deposition (PLD) (Eason, 2007). The last method has been found to be a more effective technique than other reported methods for the deposition of oxide, nitride, and carbide thin films (Eason, 2007;Wei et al, 2016).…”