“…More recently, modified versions of this source design 52 have emerged which enable room temperature direct current (DC) sputtering, 53 pulsed sputtering, 54,55 pulsed gas aggregation, 56 and perhaps, most importantly, sputtering of multiple independent targets in the same region of gas aggregation. 57,58 Collectively, these different source configurations have been used to prepare a diverse range of nanomaterials on surfaces for studies in catalysis, 46,59,60 photovoltaics, 61,62 magnetism, [63][64][65] cluster-surface interactions, [66][67][68] hydrophobic coatings, 69 mass-spectrometry imaging, 70 and optical spectroscopy. 71 It should be noted, however, that all of these source designs produce a distribution of nanoparticle sizes and compositions that must be filtered in the gas-phase using mass-spectrometry techniques in order to prepare a well-defined beam of selected particles for subsequent deposition onto surfaces.…”