Magnetoresistance studies and optimization of deposition parameters of pulsed electron deposited La0.6Pb0.4Mn0.8Ru0.2O3thin films

Singh, Brajendra; Manoharan, S. Sundar; Lim, Se Hwan; Salamanca‐Riba, L.

doi:10.1051/epjap/2011100456

Eur. Phys. J. Appl. Phys.

2011

DOI: 10.1051/epjap/2011100456

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Magnetoresistance studies and optimization of deposition parameters of pulsed electron deposited La_0.6Pb_0.4Mn_0.8Ru_0.2O₃thin films

Brajendra Singh¹,

S. Sundar Manoharan²,

Se Hwan Lim³

et al.

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2013

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Electron molecular beam epitaxy: Layer-by-layer growth of complex oxides via pulsed electron-beam deposition

Comès

Khokhlov

et al. 2013

Journal of Applied Physics

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Complex oxide epitaxial film growth is a rich and exciting field, owing to the wide variety of physical properties present in oxides. These properties include ferroelectricity, ferromagnetism, spin-polarization, and a variety of other correlated phenomena. Traditionally, high quality epitaxial oxide films have been grown via oxide molecular beam epitaxy or pulsed laser deposition. Here, we present the growth of high quality epitaxial films using an alternative approach, the pulsed electron-beam deposition technique. We demonstrate all three epitaxial growth modes in different oxide systems: Frank-van der Merwe (layer-by-layer); Stranski-Krastanov (layer-then-island); and Volmer-Weber (island). Analysis of film quality and morphology is presented and techniques to optimize the morphology of films are discussed.

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Electron molecular beam epitaxy: Layer-by-layer growth of complex oxides via pulsed electron-beam deposition

Comès

Khokhlov

et al. 2013

Journal of Applied Physics

View full text Add to dashboard Cite

show abstract

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Magnetoresistance studies and optimization of deposition parameters of pulsed electron deposited La_0.6Pb_0.4Mn_0.8Ru_0.2O₃thin films

Cited by 1 publication

References 32 publications

Electron molecular beam epitaxy: Layer-by-layer growth of complex oxides via pulsed electron-beam deposition

Electron molecular beam epitaxy: Layer-by-layer growth of complex oxides via pulsed electron-beam deposition

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