Magnetorheological finishing for removing surface and subsurface defects of fused silica optics

Catrin, Rodolphe; Néauport, Jérôme; Taroux, Daniel; Cormont, Philippe; Maunier, C.; Lambert, S.

doi:10.1117/1.oe.53.9.092010

Cited by 58 publications

(23 citation statements)

References 22 publications

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“…Figure 5 illustrates the cerium concentration depth profile obtained. As previously noticed by Neauport et al 7 and Catrin et al, 14 the cerium concentration decreases with depth but is still significant after a few micrometers below the surface. Regarding cerium concentration on the surface, we measured the same order of magnitude as Neauport et al 7 and Gao et al, 13 ie, hundreds of ppmw on a surface layer of %1 lm.…”

Section: Icp-oes Resultssupporting

confidence: 65%

Characterization of the polishing induced contamination of fused silica optics

et al. 2016

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Section: Icp-oes Resultssupporting

confidence: 65%

Characterization of the polishing induced contamination of fused silica optics

et al. 2016

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“…DMS is composed of a LED ring placed around the sample and a high resolution camera. Surface defects scatter light coming from the LED and appear bright on a dark field [16].…”

Section: Surface Quality Characterizationsmentioning

confidence: 99%

“…With these highlights, the polishing process has been optimized to reduce the amount of surface and subsurface defects. For example, investigations about the magnetorheological finishing (MRF) provided evidence that this polishing technique was able to remove surface and subsurface defects and so improved LIDT of fused silica optics operating in UV light when combined with a small wet chemical etching [15,16]. At this step, laser damage performance of surface was considerably improved up to the level needed for ICF laser facilities and became limited mainly by surface defects such as scratches and digs which thus had to be passivated.…”

Section: Introductionmentioning

confidence: 99%

Effects of deep wet etching in HF/HNO_3 and KOH solutions on the laser damage resistance and surface quality of fused silica optics at 351 nm

Pfiffer¹,

Cormont²,

Fargin³

et al. 2017

Opt. Express

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We investigate the interest of deep wet etching with HF/HNO₃ or KOH solutions as a final step after polishing to improve fused silica optics laser damage resistance at the wavelength of 351 nm. This comparison is carried out on scratches engineered on high damage threshold polished fused silica optics. We evidence that both KOH and HF/HNO₃ solutions are efficient to passivate scratches and thus improve their damage threshold up to the level of the polished surface. The effect of these wet etchings on surface roughness and aspect is also studied. We show that KOH solution exhibit better overall surface quality that HF/HNO₃ solution in the tested conditions. Given the safety difficulties associated with the processing with HF, KOH solution appears as a pertinent alternative to HF deep wet etching.

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“…and Catrin et al. , the cerium concentration decreases with depth but is still significant after a few micrometers below the surface. Regarding cerium concentration on the surface, we measured the same order of magnitude as Neauport et al .…”

Section: Resultsmentioning

confidence: 76%

Characterization of the Polishing‐Induced Contamination of Fused Silica Optics

et al. 2016

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In this work, the polishing‐induced contamination layer at the fused silica optics surface was studied with various interface analysis techniques: Secondary Ion Mass Spectroscopy (SIMS), Electron Probe Microanalysis (EPMA), X‐Ray Photoelectron Spectroscopy (XPS), and Inductively Coupled Plasma—Optical Emission Spectroscopy (ICP‐OES). Samples were prepared using an MRF polishing machine and cerium‐based slurry. The cerium and iron penetration and concentration were measured in the surface out of defects. Cerium is embedded at the surface in a 60 nm layer and concentrated at 1200 ppmw in this layer while iron concentration falls down at 30 nm. Spatial distribution and homogeneity of the pollution were also studied in the scratches and bevel using SIMS and EPMA techniques. We saw evidence that surface defects, such as scratches, are specific places that hold the pollutants. This overconcentration is also observed in the chamfer. These new insights into the polishing‐induced contamination of fused silica optics and it repartition have been obtained using various characterization methods. Advantages and disadvantages of each one are discussed.

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Magnetorheological finishing for removing surface and subsurface defects of fused silica optics

Cited by 58 publications

References 22 publications

Characterization of the polishing induced contamination of fused silica optics

Characterization of the polishing induced contamination of fused silica optics

Effects of deep wet etching in HF/HNO_3 and KOH solutions on the laser damage resistance and surface quality of fused silica optics at 351 nm

Characterization of the Polishing‐Induced Contamination of Fused Silica Optics

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