The equivalent parallel capacitance C m and conductance G m of a metal-insulator-semiconductor (MIS) device prepared on low-concentration p-type Hg 1−x Cd x Te (x ≈ 0.2) exhibit, in an external magnetic field, well-resolved oscillations both as a function of gate voltage V g and magnetic field B , when biased into inversion. The oscillations result from a magnetic-field-induced modulation of the two-dimensional (2D) density of states (Landau levels) either in the inversion layer developed under the MIS gate contact (when measured at fixed B ) or in the inverted surface under the passivating anodic oxide layer in the area surrounding the gate (when measured as a function of B with V g kept constant). The minority carrier transport mechanism is discussed and by using Fourier analysis of the observed oscillations, the number and partial occupancies of the 2D quantized subbands of the inverted surface layer are deduced. The shallow acceptor activation energy E a = 4.4 ± 0.2 meV is evaluated from the observed carrier freeze-out.