Vacuum Deposition Onto Webs, Films and Foils 2015
DOI: 10.1016/b978-0-323-29644-1.00020-7
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Magnetron Sputtering Source Design and Operation

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Cited by 3 publications
(2 citation statements)
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“…In our optical simulations, the refractive index n of the spacer layer is varied over a broad range from n = 1.25 to n = 2.5, since simulation gives us the freedom to choose any arbitrary value for n. In order to address the real working device, as examples, the optical data from common optical spacer materials, like Silicon Nitride (SiN; n (SiN) = 2.0458), Magnesium Floride (MgF 2 ; n (MgF 2 ) = 1.3777), and polymethylmetacrylate (PMMA; n (PMMA) = 1.4906) are used as well in the simulations. In general, optical mediums, such as SiN and MgF 2 , can be coated by sputtering [47,48], thermal evaporation [49,50,51], and atomic layer deposition (ALD) [52] while polymer-based spacers such as Polymethylmethacrylate (PMAA) can be coated by solutions using different methods, such as spin, blade, slot die, and spray coating [53]. The spacer thickness is varied from 0 nm up to 320 nm, in steps of 40 nm.…”
Section: Resultsmentioning
confidence: 99%
“…In our optical simulations, the refractive index n of the spacer layer is varied over a broad range from n = 1.25 to n = 2.5, since simulation gives us the freedom to choose any arbitrary value for n. In order to address the real working device, as examples, the optical data from common optical spacer materials, like Silicon Nitride (SiN; n (SiN) = 2.0458), Magnesium Floride (MgF 2 ; n (MgF 2 ) = 1.3777), and polymethylmetacrylate (PMMA; n (PMMA) = 1.4906) are used as well in the simulations. In general, optical mediums, such as SiN and MgF 2 , can be coated by sputtering [47,48], thermal evaporation [49,50,51], and atomic layer deposition (ALD) [52] while polymer-based spacers such as Polymethylmethacrylate (PMAA) can be coated by solutions using different methods, such as spin, blade, slot die, and spray coating [53]. The spacer thickness is varied from 0 nm up to 320 nm, in steps of 40 nm.…”
Section: Resultsmentioning
confidence: 99%
“…Larger discharge currents and increased sputter deposition rates are achieved with magnetron sputtering rather than traditional sputtering technologies [241][242][243] (usually 1 µm/min is attained in RF magnetron sputtering, against the usual 0.5 µm/min of conventional RF sputtering, both considering aluminum as target material [254]). Magnetron sputtering can be applied both in direct current and radio frequency modality, but usually it is applied in RF modality because of the higher deposition rates; it can be used to deposit thin films with thickness from tens of nanometers to tens of micrometers [254,260]. The magnetron sputtering process is shown in Figure 28.…”
Section: Magnetron Sputteringmentioning
confidence: 99%