2010
DOI: 10.1038/nphoton.2009.252
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Cited by 21 publications
(6 citation statements)
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“…3,4 However, it is either challenging or extremely costly to generate sub-10-nm features. 5 In the past decades, self-assembled structures including lamellae, gyroid structures, cylinders, and spheres constructed using block copolymers (BCPs) have been widely investigated. [6][7][8] However, the feature sizes of traditional BCPs are usually larger than 10 nm.…”
Section: Introductionmentioning
confidence: 99%
“…3,4 However, it is either challenging or extremely costly to generate sub-10-nm features. 5 In the past decades, self-assembled structures including lamellae, gyroid structures, cylinders, and spheres constructed using block copolymers (BCPs) have been widely investigated. [6][7][8] However, the feature sizes of traditional BCPs are usually larger than 10 nm.…”
Section: Introductionmentioning
confidence: 99%
“…High viscous UV curable resins generally exhibit high selectivity for dry etching [13] and various refractive indices [14]. The combination of the latter benefit with lab-on-a-chip [15][16][17] technology is expected to result in great progress in biology [18] and chemical engineering [19]. A thin RL is necessary when using high viscous UV curable resins for dry etching masks.…”
Section: Introductionmentioning
confidence: 99%
“…NGL technology would be familiarised and alike adept for the probable imminent in a mix-and-match mode along with optical lithography. Continuing developments based on NIL are leading semiconductor manufacturers to use this technological development as a probable auxiliary for optical lithography, but which may be limiting due to its reduced capacity [33,34]. As a consequence, the existing tumult in the fabrication of novel technological developments is associated with the development of innovative thoughts on the emerging field of nanotechnology, high-power LEDs, nano/micro-ICs and so on.…”
Section: Next-generation Lithography In the New Skylines Of Science Amentioning
confidence: 99%