2008
DOI: 10.1016/j.scriptamat.2008.02.039
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Making the surface of nanocrystalline Ni on an Si substrate ultrasmooth by direct electrodeposition

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Cited by 17 publications
(10 citation statements)
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“…From these images, the peak‐to‐valley distance values were estimated to be at around 20 nm over 1 µm × 1 µm areas for all films, and the root mean square (RMS) values were also found to be very low, about 2–3 nm. Such small values can be ascribed to the nanocrystalline nature of the films,33 since microcrystalline electrodeposited alloys usually exhibit much rougher surfaces, with peak‐to‐valley distances that can reach several hundreds of nanometers 34, 35. The low roughness accounts for the mirror‐bright finish of the Cu–Ni films, in contrast to the grey appearance of deposits prepared from saccharine‐free baths, which are coarse‐grained (showing 1–3 µm nodules) 26…”
Section: Resultsmentioning
confidence: 99%
“…From these images, the peak‐to‐valley distance values were estimated to be at around 20 nm over 1 µm × 1 µm areas for all films, and the root mean square (RMS) values were also found to be very low, about 2–3 nm. Such small values can be ascribed to the nanocrystalline nature of the films,33 since microcrystalline electrodeposited alloys usually exhibit much rougher surfaces, with peak‐to‐valley distances that can reach several hundreds of nanometers 34, 35. The low roughness accounts for the mirror‐bright finish of the Cu–Ni films, in contrast to the grey appearance of deposits prepared from saccharine‐free baths, which are coarse‐grained (showing 1–3 µm nodules) 26…”
Section: Resultsmentioning
confidence: 99%
“…The rms surface roughness of the film was found equal to 2.32 nm ± 0.3 nm, which is significantly smaller than that in electroplated Ni films with coarse grain sizes. 47 We could not find any trace of oxide from both light optical and scanning electron microscopy inspections. The microhardness of the nanocrystalline Ni electrodeposit was found equal to 5.93 GPa ± 0.13 GPa at an applied load of ~500 mN.…”
Section: A Materials Structure and Microhardnessmentioning
confidence: 73%
“…47 The anode material was a 99.9945%-purity Ni foil. butyne-1,4-diol and 1.0 g⋅L -1 of saccharin were added to promote both grain refinement and ultra-low surface roughness.…”
Section: A Materials Synthesismentioning
confidence: 99%
“…The surface topology is not smooth, rather a discontinuous grain structure was observed which was not detected in AFM topography images using a standard commercial probe. The fine details of the grain structure of metal films can be resolved with ultrasharp probes . As a further processing step, we annealed several samples of Ni nanorings at temperatures ranging from 50 to 300 °C; however, the shapes of the nanorings were not retained after the heating step.…”
Section: Resultsmentioning
confidence: 99%