1999 IEEE LEOS Annual Meeting Conference Proceedings. LEOS'99. 12th Annual Meeting. IEEE Lasers and Electro-Optics Society 1999
DOI: 10.1109/leos.1999.811950
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Manufacturable planar bulk-InP avalanche photodiodes for 10 Gb/s applications

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Cited by 17 publications
(6 citation statements)
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“…These curves all show nonmonotonous dependence on the multiplication layer thickness, and a minimum is found at about 0.225 µm for the nominal multiplication layer thickness. This feature is qualitatively consistent with the simulation results based on traditional multiplication formula as reported by Itzler et al 33,35 and by Park et al 36 The explanation for this minimum could be referred to Fig. 2.…”
Section: Results Analyses and Discussionsupporting
confidence: 92%
See 1 more Smart Citation
“…These curves all show nonmonotonous dependence on the multiplication layer thickness, and a minimum is found at about 0.225 µm for the nominal multiplication layer thickness. This feature is qualitatively consistent with the simulation results based on traditional multiplication formula as reported by Itzler et al 33,35 and by Park et al 36 The explanation for this minimum could be referred to Fig. 2.…”
Section: Results Analyses and Discussionsupporting
confidence: 92%
“…When using (4) to compute the normalized frequency response and to evaluate the -3 dB bandwidth, the total operating capacitance C is usually less than 0.3 pF 32 (about 0.20 -0.23 pF 33,34 ), and it is taken as 0.2 pF during our modeling. The average resistance including load resistance is taken as 50 Ω for our modeling.…”
Section: Modeling Detailsmentioning
confidence: 99%
“…The time period between the gates was 100 µs, corresponding to a repetition rate of 10 kHz for all the measurements, to avoid the effects of afterpulsing. The Epitaxx EPM239AA has a nominal active area diameter of 40 m and some information regarding its microstructure has been published previously [21], [22]. This published material indicates that the p-well is obtained by two different zinc diffusion processes.…”
Section: Device Characteristicsmentioning
confidence: 99%
“…Fig. 1 shows a schematic cross section of an InP/InGaAsP/InGaAs SACM APD with a double diffused floating guard ring [22]. The adjacent graph shows the electric field profile normal to the surface and illustrates how the charge layer is used to tailor the relative fields in the multiplication and absorption layers.…”
Section: Introductionmentioning
confidence: 99%