1993
DOI: 10.1016/0169-4332(93)90479-u
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Maskless excimer laser induced projection patterning of InP in Cl2 etch gas

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Cited by 16 publications
(4 citation statements)
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“…The spectra contain a low-intensity peak at ϳ396 eV, which is assigned to InN x . 22 The laser fluence in this study is enough to prevent InP surface melting. 16,24 The presence of the NH z signal is most likely a result of insufficient decomposition of the NH 3 molecule at the sample surface.…”
Section: B Laser Nitridation Of Inp Surfacementioning
confidence: 92%
“…The spectra contain a low-intensity peak at ϳ396 eV, which is assigned to InN x . 22 The laser fluence in this study is enough to prevent InP surface melting. 16,24 The presence of the NH z signal is most likely a result of insufficient decomposition of the NH 3 molecule at the sample surface.…”
Section: B Laser Nitridation Of Inp Surfacementioning
confidence: 92%
“…Although there have been numerous studies of the effects of nanosecond laser pulses on compound semiconductors [12][13][14], no research has been reported on the surface evolution due to multiple UV laser pulses with uniform intensity distribution below the single-pulse ablation threshold. Hence, investigation of such evolution of InP surfaces caused by irradiation with a series of nanosecond pulses of UV laser radiation with fluences below the single-pulse ablation threshold presents interest as an approach for controlled surface modification of InP and other semiconductors.…”
Section: Introductionmentioning
confidence: 99%
“…Nanosecond pulses cause mostly thermal effects while pico-to femtosecond pulses form localized defect structures. Nanosecond laser pulses of different wavelengths can be used for applications such as: surface alloy formation [9], modification of photoelectric and electrical properties of the surface [10], surface annealing [11], dry etching [12][13][14] and surface cleaning [15].…”
Section: Introductionmentioning
confidence: 99%
“…Although substantial effort concerning photo-excited processes and LDE of semiconductors has been documented in the literature [32][33][34][35][36][37][38][39][40][41][42][43][44] it remains to be seen whether this method would find its niche in commercial applications. Examples of successful implementation of the LDE technology for device applications include fabrication of InAlAs/InGaAs high-electron-mobility transistors [45], integrated InP microlenses [46] and GaAs/AlGaAs multiple quantum well circular ring lasers [47].…”
Section: Figmentioning
confidence: 99%