Articles you may be interested inFabrication and characterization of metal-insulator-semiconductor structures by direct nitridation of InP surfaces Appl. Phys. Lett. 96, 012107 (2010); 10.1063/1.3269906 X-ray photoelectron spectroscopic study on sapphire nitridation for GaN growth by hydride vapor phase epitaxy: Nitridation mechanism Stability of sulfur-treated InP surface studied by photoluminescence and x-ray photoelectron spectroscopy Nitridation of InP is performed by KrF excimer laser irradiation in an NH 3 ambient. The N-In and N-P bonds are formed in the irradiated area in proportion to the number of laser pulses. The x-ray photoelectron spectroscopy spectra of the nitrided samples contain a small concentration of oxide components after aging in an air atmosphere than nonirradiated samples