Maskless lithography

Pease, R. F. W.

doi:10.1016/j.mee.2005.01.009

Cited by 42 publications

(11 citation statements)

References 14 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Maskless lithography is a technique that adopts a spatial light modulator (SLM) instead of photomasks [1][2][3][4]. The pattern of the conventional mask-based lithography resembles the shape of the photomask.…”

Section: Introductionmentioning

confidence: 99%

Measuring two-dimensional profiles of beam spots in a high-density spot array for a maskless lithography system

Kang

Hahn

2014

Appl. Opt.

View full text Add to dashboard Cite

We measure two-dimensional (2D) profiles of beam spots in a high-density spot array for a maskless lithography system. Since the size of each spot is comparable to that of a pixel in a charge-coupled device (CCD), we detect image frame data, which are the distribution of the intensity of the spot overlapped on the active area of the pixel in the CCD, by scanning with a nano-stage. Using the image frame data of the scanning CCD we determine reconstructed images of the beam spot array. We calculate the 2D profile of each spot by taking the deconvolution of the reconstructed image of the spot with the active area of the CCD pixel. We theoretically analyze the uncertainty in the measurement of profiles in terms of spot size for the variation of the scanning step of the nano-stage and determine the step size to achieve uncertainty of less than 100 nm. We experimentally demonstrate the measurement of profiles of an 11×11 spot array for the proof of concept. Also, we analyze various parameters of the spot array, such as ellipticity, rotation of the spot profile, spot size, intensity distribution, and position.

show abstract

Section: Introductionmentioning

confidence: 99%

Measuring two-dimensional profiles of beam spots in a high-density spot array for a maskless lithography system

Kang

Hahn

2014

Appl. Opt.

View full text Add to dashboard Cite

show abstract

“…Multibeam, projection, and electron and ion beam lithographies [3][4][5], as well as nanoprinting technology [6], inspired great hopes and still remain promising. Although these techniques have already found appropriate niches, they continue to exhibit rapid development.…”

Section: Introductionmentioning

confidence: 99%

Diffraction-limited short-wavelength optics: Analysis, fabrication, and application

Салащенко

Чхало

2012

J. Synch. Investig.

View full text Add to dashboard Cite

The fundamental physical and technological problems of fabrication and testing, as well as new optics applications providing diffraction quality images (with spatial resolutions varying from tens of nanom eters to several nanometers) at wavelengths of 3-60 nm, are analyzed. This type of optical systems is required in the mass production of very large scale integrated circuits (ICs) (projection nanolithography), nanocerti fication (high resolution X ray microscopy), macrodiagnosis (extraterrestrial astronomy), and in fundamen tal investigations of the interaction between a material (vacuum) and superstrong electromagnetic fields (10 20 -10 23 W/cm 2 ). The current state of interaction studies around the world has been reviewed.

show abstract

“…The preparation of high quality lithography masks becomes time consuming and expensive and it prohibits the applications in scientific research as well as device prototype, where frequent design changes are often needed. On the other hands, maskless nanolithography, including electron-beam, focused ion-beam and scanning-probe lithography offers a path overcomes many of these obstacles by reducing mask costs and shortening the cycle time for device validation [3][4][5][6][7][8][9][10][11] . Furthermore, such a technology with growing attentions from scientific and engineering community will undoubtedly play an important role in the next-generation manufacturing for emerging applications such as nanotechnology.…”

Section: Introductionmentioning

confidence: 99%

Flying plasmonic lens at near field for high speed nanolithography

et al. 2010

View full text Add to dashboard Cite

Optical lithography has been the key for continuous size reduction of semiconductor devices and circuits manufacturing 1-2 . Although the industry is continually improving the resolution, optical lithography becomes more difficult and less cost effective in satisfying the ever increasing demands in nano-manufacturing. Besides manufacturing, the dramatic advancements in nanoscale science and engineering also call an urgent need for high-throughput nano-fabrication technologies that are versatile to frequent design changes. Here we experimentally demonstrated the capability of patterning with 50 nm linewidth with a high flying speed at 10 meter/second. This low-cost nano-fabrication scheme has the potential of a few orders of magnitude higher throughput than current maskless techniques, and promises a new route towards the next generation nano-manufacturing. Besides its application in nanolithography, this technique can also be used for nanoscale metrology, imaging and data storage.

show abstract

Maskless lithography

Cited by 42 publications

References 14 publications

Measuring two-dimensional profiles of beam spots in a high-density spot array for a maskless lithography system

Measuring two-dimensional profiles of beam spots in a high-density spot array for a maskless lithography system

Diffraction-limited short-wavelength optics: Analysis, fabrication, and application

Flying plasmonic lens at near field for high speed nanolithography

Contact Info

Product

Resources

About