2014
DOI: 10.1021/jp510809a
|View full text |Cite
|
Sign up to set email alerts
|

Maskless Ultraviolet Projection Lithography with a Biorepelling Monomolecular Resist

Abstract: Here, we describe a universal photolithography setup for the patterning of biorepulsive self-assembled monolayers (SAMs) as well as other monomolecular films. The setup is based on commercial equipment consisting of a computer-controlled digital micromirror device chip combined with a suitable optics and a powerful light-emitting diode (LED) source delivering ultraviolet (UV) light with a wavelength of 375 nm. Digital patterns generated in the computer serve as an input for the chip, which modulates the reflec… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2

Citation Types

1
26
0

Year Published

2016
2016
2022
2022

Publication Types

Select...
8

Relationship

3
5

Authors

Journals

citations
Cited by 17 publications
(27 citation statements)
references
References 38 publications
1
26
0
Order By: Relevance
“…Our data on partial desorption of SAMs upon UV irradiation are coherent with results published by Leggett and Zharnikov, who described experiments of similar compounds in air and aqueous conditions. In their work, they describe a dependence on the wavelength with the rate of degradation of the ethylene glycol chains while the alkanethiol part was primarily unaffected.…”
Section: Results and Discussionsupporting
confidence: 91%
“…Our data on partial desorption of SAMs upon UV irradiation are coherent with results published by Leggett and Zharnikov, who described experiments of similar compounds in air and aqueous conditions. In their work, they describe a dependence on the wavelength with the rate of degradation of the ethylene glycol chains while the alkanethiol part was primarily unaffected.…”
Section: Results and Discussionsupporting
confidence: 91%
“…[104] IPER also served as an inspiration for an analogous approach utilizing ultraviolet light instead of electrons, which has several advantages, such as applicability in ambient and even liquid environments, but also drawbacks, such as a lower lateral resolution and less broad choice of commercial lithographic setups. [105][106][107][108][109] So far, IPER and IPER-based chemical lithography have been exclusively used for purely scientific purposes, but we envision that this technology will also be recognized and used by the industrial community, resulting in simplified fabrication routes and new nanotechnological products.…”
Section: Discussionmentioning
confidence: 99%
“…Patterning techniques have been initially developed for applications in semiconductor industry [1] and were later adopted to enable spatiotemporal protein immobilization as well as structuring of proteinbased materials. A plethora of techniques are available nowadays to realize protein pattern, such as micro-contact printing, [2][3][4][5][6] inkjet printing [7] and optical lithography [8][9][10] all of them enabling micropattern generation on large-scales. Interferometric lithography, [11] electron beam lithography, [12,13] dip pen nanolithography, [14][15][16][17] nanoimprint lithography, [18,19] scanning probe lithography, [20,21] nearfield lithography, [22,23] on the other hand provide pattern down to the nanometer scale.…”
Section: Introductionmentioning
confidence: 99%