ESSCIRC '88: Fourteenth European Solid-State Circuits Conference 1988
DOI: 10.1109/esscirc.1988.5468276
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Matching properties of MOS transistors

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Cited by 233 publications
(300 citation statements)
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“…This is because of the inverse relationship between the effect of process variations and the gate area. 50 Self cascodes were adopted in order to obtain a large output resistance and in turn increase the common-mode rejection ratio. 13 By virtue of the common-mode feedback (CMFB), the biasing voltages are kept at V DD /2.…”
Section: Review On the Design Of Inverter-based Amplifiersmentioning
confidence: 99%
“…This is because of the inverse relationship between the effect of process variations and the gate area. 50 Self cascodes were adopted in order to obtain a large output resistance and in turn increase the common-mode rejection ratio. 13 By virtue of the common-mode feedback (CMFB), the biasing voltages are kept at V DD /2.…”
Section: Review On the Design Of Inverter-based Amplifiersmentioning
confidence: 99%
“…Furthermore, the maximum deviation from the ideal output voltage level due to the ±5% tolerance on the channel length of active load transistors is the same ±0.25% error which occurs on 8% of samples. Additionally, the output DC voltage histogram for a tolerance on the threshold voltage of all transistors based on the Pelgrom's model [18] with a Gaussian distribution and 50 iterations is illustrated in Figure 18, in which 6% of samples have the maximum deviation equal to ±0.56% error from the ideal output voltage level.…”
Section: Post Layout Performance Characterizationmentioning
confidence: 99%
“…Process variations are particularly important in subthreshold analog design as a consequence of the exponential sensitivity of the drain current to the threshold voltage variations induced by the random dopant fluctuations and oxide thickness variation. A common and simple way to estimate the effect of the process variations is proposed in [21] where the standard deviation of the threshold voltage of a pair of MOS transistors is evaluated as…”
Section: Process Variationsmentioning
confidence: 99%
“…In the proposed voltage reference, V REF is approximated by the difference between the two threshold voltages. For this reason, according to [21], to obtain a good process stability, a large area for both transistors is necessary. However, it is worth to note that (21) takes in account only the process mismatches induced by random variations but neglects the effect of the systematic mismatches such as temperature and stress.…”
Section: Process Variationsmentioning
confidence: 99%
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